Preparation of a silicon micro-strip nuclear radiation detector by a two-step annealing process
Preparation of a silicon micro-strip nuclear radiation detector by a two-step annealing process
Abstract
The annealing process for boron implantation is a crucial step during large size nuclear radiation detector fabrication. It can reduce the lattice defects and the projection straggling. A two-step annealing process for boron implantation was developed ins
关键词
核辐射探测器/硅微条探测器/退火工艺/硼离子注入/制备/晶格缺陷/两步退火/大尺寸Key words
nuclear radiation detector/two-step annealing/reverse body resistance引用本文复制引用
出版年
2011
NETL
NSTL
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