首页|Preparation of a silicon micro-strip nuclear radiation detector by a two-step annealing process
Preparation of a silicon micro-strip nuclear radiation detector by a two-step annealing process
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The annealing process for boron implantation is a crucial step during large size nuclear radiation detector fabrication. It can reduce the lattice defects and the projection straggling. A two-step annealing process for boron implantation was developed ins
nuclear radiation detectortwo-step annealingreverse body resistance
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