首页|V2NO2/TiSi2N4异质结界面性质调控的理论研究

V2NO2/TiSi2N4异质结界面性质调控的理论研究

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使用第一性原理计算研究了外加电场对V2NO2/TiSi2N4异质结构接触类型和肖特基势垒的调控.计算结果表明,外电场可以有效地调控V2NO2/TiSi2N4肖特基势垒的高度及其异质结的接触类型.正负向外电场均能实现V2NO2/TiSi2N4异质结构p型与n型肖特基接触之间的动态转化.此项工作为基于TiSi2N4半导体的肖特基功能器件及场效应晶体管的应用提供理论基础.
Theoretical study of the modulation of interfacial properties of V2NO2/TiSi2N4 heterojunctions
The modulation of the contact type and Schottky barrier of V2NO2/TiSi2N4heterostructures by an applied electric field is investigated using first principles calculations.The results show that the external electric field can effectively regulate the height of the V2NO2/TiSi2N4 Schottky barrier and the contact type of the heterojunction.Both positive and negative external electric fields can achieve the dynamic transition between p-type and n-type Schottky contacts in the V2NO2/TiSi2N4 heterostructure.This work provides a theoretical basis for the application of Schottky functional devices and field-effect transistors based on TiSi2N4 semiconductors.

MXenesheterojunctionsSchottky barriersfirst principlesMA2Z4

冯继辰、马宁、牛丽

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哈尔滨师范大学物理与电子工程学院,黑龙江哈尔滨 150025

哈尔滨师范大学计算机科学与信息工程学院,黑龙江哈尔滨 150025

MXenes 异质结 肖特基势垒 第一性原理 MA2Z4

2024

高师理科学刊
齐齐哈尔大学

高师理科学刊

影响因子:0.351
ISSN:1007-9831
年,卷(期):2024.44(1)
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