The micro-arrayed beam blanker is essential for the multi-beam electron beam lithography sys-tem,enabling the rapid exposure of complex graphics by controlling the electron beam's opening and clos-ing. In this study,a 3×3 micro-arrayed beam blanker was designed and fabricated,followed by an experi-ment on multi-beam electron beam deflection. Based on prior optimization,the structural design and MEMS-based processing technology were developed,resulting in successful fabrication of the beam blank-er. A controller capable of independently managing the multi-beam was then created and connected to the beam blanker to validate its deflection speed and functionality. The deflection experiment conducted on a multi-beam test platform examined crosstalk effects. Results indicate that the controller's deflection speed reaches 43.5 MHz,exceeding the design target of 10 MHz. The beam blanker independently opens and closes the electron beam,with a deflection range of 25-30 μm,which is below the predicted 43.29 μm. Crosstalk levels were all under 3％. While the designed micro-arrayed beam blanker effectively controls the multi-beam electron beam,further optimization is needed for deflection accuracy and processing tech-nology.
关键词
电子束曝光/阵列束闸/多束电子束/串扰/偏转速度
Key words
electron beam lithography/arrayed beam blanker/multi-beam electron beam/crosstalk/deflection speed
维普
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