Grating interferometry is a crucial technology in precision nanometrology,valued for its high resolution,robustness,and adaptability for multi-axis measurement systems.It is essential in advanced semiconductor manufacturing and ultra-precision machine tools.This review first compares grating interfer-ometry with laser interferometry and time grating,detailing their applications and performance.It then ex-plains the two main principles:homodyne and heterodyne grating interferometry.The review also analyzes global development trends,highlighting key manufacturers and advancements in achieving nanometric to sub-nanometric precision in single and multi-axis systems.In addition,it examines error sources,classifica-tions,and compensation methods in grating interferometry.Finally,it discusses the current state and fu-ture prospects of grating interferometers,offering insights for developing and optimizing measurement sys-tems based on this technology.
precision measurementnano measurementgrating interferometermultiple degrees of free-domerror compensation
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