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离子束辅助沉积(IAD)镀制抗电磁干扰与减反射复合薄膜

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在K9玻璃基底上将两种物理性能完全不同的薄膜形成组合膜系层,实现了抗电磁干扰、高透光的效果.技术指标为:在400nm-1100nm宽波段范围平均透光率不低于90%;为达到良好的抗电磁干扰屏蔽效果,抗电磁屏蔽其方块电阻值为4±0.5Ω/口.为满足设计技术指标要求,计算设计了抗电磁干扰与减反射复合膜系结构,进行了镀膜工艺实验.实验结果表明,通过采用离子束辅助沉积工艺技术,可改善光学薄膜的微观结构,进而提高了复合薄膜的光学、物理性能和膜层的稳定性.
Coated technology on composite thin-film of anti-electromagnetic interference and anti-reflecting film by ion assisted deposition
Two kinds of thin-film with full different physic performances are combined together on K9 glass substrate to form composite film layer,achieving anti-electromagnetic interference and high light-transmitting.Technical performance index:light-average transmissivity is not less than 90% in 400nm-1100nm.The resistance value on anti-electromagnetic interference shielding surface is 4 ± 0.5Ω/口 to achieve a good anti-electromagnetic interference shielding.A complex film construction composed of electromagnetic interference resistance and reducing reflecting coating is designed to meet the technical performance requirements and coating experiment is carried out.The experiment result shows that microstructure of optical thin film can be improved by ion assisted deposition technology to increase optical performance,physical performance and durability of complex thin film.

ion beam assisted depositionanti-electromagnetic interference layeranti-reflecting filmcomposite thin-film

杨伟声

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北方夜视科技集团有限公司,昆明650223

离子束辅助沉积(IAD) 抗电磁干扰镀层 减反射薄膜 复合薄膜

2014

光学技术
北京兵工学会 北京理工大学 中国北方光电工业总公司

光学技术

CSTPCDCSCD北大核心
影响因子:0.441
ISSN:1002-1582
年,卷(期):2014.40(1)
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