首页|平行平板光学参数的快速高精度测量方法

平行平板光学参数的快速高精度测量方法

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提出一种基于特征多项式的波长移相干涉测量方法。首先,将该方法与两步绝对测量法结合,对多表面干涉技术进行理论研究;然后,以特征图和特征多项式理论为基础设计出一种加权多步波长移相算法,用于对平板的表面面形、光学厚度变化以及光学均匀性信息进行提取计算,并通过移相算法的评价函数及其傅里叶表达式展示了算法对误差的抗扰度;最后,将该算法与OPL算法进行对比。结果表明,所提方法在不同厚度平行平板光学均匀性的测量上具有速度快、精度高的优势。
Fast and High-Precision Measurement Method of Optical Parameters of Parallel Flat Plates
Objective As an important part of optical materials,optical transmission materials are widely employed in optical display and optical communication,and their optical properties play a key role in the whole optical system.The optical properties of optical transmission materials mainly include optical uniformity,optical thickness,surface shape,fringes,and bubbles.The optical parallel plate is strictly controlled by its design parameters.If the optical uniformity,optical thickness,surface shape,and other optical parameters of the plate are inconsistent,the optical wave front will be changed when the light wave passes through,thus degrading the optical system performance.Therefore,the optical uniformity,thickness,and surface shape of optical materials are significant performance indicators for high-precision optical systems.To solve the problem of slow speed,low efficiency,and small measurement range of optical parameters of parallel plates with different thicknesses,we propose a wavelength phase-shifting interferometry method based on characteristic polynomial.Methods This method combines the two-step absolute measurement method to carry out theoretical research on multi-surface interference technology.Then we design a weighted multi-step wavelength shift algorithm based on the feature map and feature polynomial theory,which is employed to extract and calculate the surface shape,optical thickness changes,and optical uniformity information of the plate.The specific process is as follows.The evaluation function and Fourier expression of the phase-shifting algorithm show the immunity of the algorithm to the errors.Finally,the algorithm is compared with the OPL algorithm.Firstly,the two-step absolute measurement method is combined with the theoretical research on multi-surface interference technology.Then a weighted multi-step wavelength phase-shifting algorithm is designed based on the feature map and feature polynomial theory,which is adopted to extract and calculate the surface shape,thickness changes,and optical uniformity information of the plate surface.The evaluation function of the phase-shifting algorithm and its Fourier expression are utilized to show the immunity of the algorithm to errors.Among them,the weighted multi-step wavelength shift algorithm based on the characteristic polynomial theory is designed as follows.First,the measured plate is placed in an interference cavity,and 77 interferograms are obtained by wavelength-tuned phase-shifting interference.The superimposed interference region of each interferogram is composed of six groups of first-order interference fringes.According to these interferograms,the feature graphs are designed and the corresponding feature polynomials are written.The characteristic polynomial is polynomial expanded,and the sampling amplitude is obtained by simultaneous solution combined with the relative frequency amplitude of the target information.The phase information is obtained by taking the two into the phase calculation formula,and the corresponding wave front information is obtained after the phase information is unpacked and de-tilted.Then,the measured plate is removed for cavity measurement,and the cavity phase information obtained by cavity measurement is unpacked and de-tilted to obtain cavity wavefront information.Finally,the optical uniformity of the parallel plate can be obtained by bringing the information of the two wave fronts into the calculation formula.Results and Discussions The proposed method features high speed and high precision in measuring the optical uniformity of parallel plates with different thin thicknesses.The PV and RMS errors of the 77-step phase-shifting algorithm and OPL algorithm are in the order of 10-8,and the PV errors of the surface shape and optical thickness changes are within λ/100.The PV and RMS errors calculated for the optical uniformity of parallel plate are in the order of 10-7.and the PV errors of surface shape and optical thickness are within λ/100.The data show that the calculation results of the two methods are basically consistent,and the measurement accuracy of 40 mm parallel plate is slightly higher than that of 5 mm parallel plate(Table 4).However,the 77-step algorithm is much better than the OPL algorithm in computational efficiency and speed because the required number of interference samples is much smaller than that of OPL algorithm(Table 5).Conclusions We study a multi-step wavelength phase-shifting algorithm based on the characteristic polynomial theory.Based on the conventional phase-shifting algorithm and the characteristic polynomial theory,three groups of 77-step algorithms are designed according to the target requirements for measuring and calculating the surface shape,optical thickness changes,and optical uniformity of parallel flat surfaces.Additionally,the evaluation function diagram of the algorithm is drawn to show the sensitivity and immunity of the algorithm to errors.The measurement results show that the 77-step phase-shifting algorithm can suppress harmonic errors,phase-shifting errors,and other coupling errors.Meanwhile,the algorithm requires fewer interferograms with high detection efficiency,takes into account the computational efficiency with high precision,and is suitable for optical parameter measurement of parallel plates with different thicknesses.The problems are solved such as the large number of interferograms required by existing algorithms,large computational amount,partial error compensation,and sensitivity to harmonic frequency mismatch or deviation.

measurementwavelength phase-shiftingcharacteristic polynomialsoptical uniformity

钱宇、郭仁慧、蒋金威、薛亮、刘杨、李建欣

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南京理工大学电子工程与光电技术学院,江苏南京 210094

测量 波长移相 特征多项式 光学均匀性

国家自然科学基金国家自然科学基金国家自然科学基金

62171225U20311316197507

2024

光学学报
中国光学学会 中国科学院上海光学精密机械研究所

光学学报

CSTPCD北大核心
影响因子:1.931
ISSN:0253-2239
年,卷(期):2024.44(3)
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