首页|偏折角控制二向衰减及其在镜头设计中的应用

偏折角控制二向衰减及其在镜头设计中的应用

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为了在光学设计过程中控制光学镜头的二向衰减性能,实现二向衰减性能的准确控制,提出了一种基于光线偏折角控制二向衰减的方法,并展示了其在镜头设计中的应用。首先,基于菲涅耳公式和仿真验证,探寻出二向衰减与光线偏折角存在相关性,并分析出折射率不影响二向衰减与光线偏折角之间的数值关系。接着,基于拟合方法建立了二向衰减和偏折角之间的多项式关系。然后,为了分析光学系统的二向衰减,进一步建立了"系统二向衰减-光线偏折角"公式。最后,基于"二向衰减-光线偏折角"公式和像差理论设计了二向衰减小于4。03%的镜头系统;基于"系统二向衰减-光线偏折角"公式成功预测了镜头的二向衰减性能。本文提出的方法对设计过程中控制和预测镜头的二向衰减性能具有参考意义。
Deflection Angle Control Bidirectional Attenuation and Its Application in Lens Design
Objective Advanced manufacturing is often limited by detection accuracy,with commonly used high-precision detection methods including optical detection,electron beam detection,and thermal imaging. Among these,optical detection offers advantages such as high efficiency,high sensitivity,and non-destructive testing. However,the accuracy of optical detection remains a challenge that restricts its broader application. By leveraging the polarization characteristics of light,an additional dimension of effective information can be introduced to improve detection accuracy. The polarization characteristics of light are widely used in semiconductor detection. For example,horizontal and vertical line-space patterns on wafer surfaces exhibit different sensitivities to light polarization,leading to varying detection sensitivity for the same type of defects. Optical lenses are critical devices in optical detection,but research shows that lenses can affect the polarization characteristics of light,which in turn affects detection accuracy. While previous studies have attempted to reduce the influence of lens polarization through coatings,no quantitative method exists to control the effect of lenses on polarization characteristics during the optical design process. Therefore,developing a simple and effective design method for controlling bidirectional attenuation in lenses to improve detection accuracy holds scientific significance. In typical lens designs,bare lenses are often used,and ideally,bare lenses only affect bidirectional attenuation in polarization characteristics. In this paper,we explore a method to control bidirectional attenuation through light deflection angle.Methods Using Fresnel equation simulations,we verified Chipman's conclusion that bidirectional attenuation is primarily influenced by the back surface of the lens. Since bidirectional attenuation is not a primary design criterion in optical systems,we attempted to represent it with a more intuitive index. By modeling an ideal lens and evaluating the influence of various optical incident and exiting angles on bidirectional attenuation,we discovered that the bidirectional attenuation caused by both the front and back surfaces of the lens is equivalent when the light deflection angle is the same. This led to the development of a strategy to control bidirectional attenuation in optical design using the light deflection angle. Given that different lens materials are used in optical design,we also evaluated the refractive index of the ideal lens model and found that the bidirectional attenuation values remained consistent across different refractive indexes for the same deflection angle,eliminating refractive index as a factor. We established the functional relationship between deflection angle and bidirectional attenuation through data fitting,arriving at a quadratic equation. The fitting accuracy and adjusted R-squared values confirmed the high precision of the fit. In addition,we analyzed the cumulative bidirectional attenuation in a multi-lens system using a cumulative multiplication approach.Results and Discussions An ultraviolet microscope detection lens (Fig. 16) is designed using the bidirectional attenuation-light deflection angle (B-L) formula. Its initial structure is determined by the B-L formula and primary aberration theory,resulting in the design of a three-element lens. The first lens is curved toward the object side,while the third lens is curved toward the image side (Fig. 9). Maintaining symmetry in the design helps correct for coma,astigmatism,and distortion. During optimization,the B-L formula is used to effectively control the light deflection angle,ensuring that the lens meets the expected bidirectional attenuation performance. However,a fully symmetrical structure cannot achieve the required magnification,leading to the application of the Stop-Shift theory to break the lens symmetry and finalize the design. The resulting design meets the required imaging performance,with the root mean square (RMS) radius of the full field of view exceeding the diffraction limit. Field curvature is controlled within±0.8 μm,and distortion is kept below 0.25%. The actual bidirectional attenuation performance,as traced through ray simulations,closely matched the predictions from the system bidirectional attenuation-light deflection angle (S-B-L) formula,fulfilling the performance expectations.Conclusions In this study,we propose a method for controlling bidirectional attenuation based on light deflection angle. Through analysis using Fresnel equations,we identify the intrinsic relationship between light deflection angle and bidirectional attenuation. By employing statistical methods,the theoretical derivation is simplified,leading to the formulation of the B-L equation for the relationship between deflection angle and bidirectional attenuation. In addition,an S-B-L formula for evaluating the cumulative bidirectional attenuation in multi-lens systems is developed. The ultraviolet microscope designed using this approach demonstrates the expected bidirectional attenuation performance. The results indicate that light deflection angle can be used to effectively characterize bidirectional attenuation. Simplifying control metrics in this way facilitates lens designs that meet expected bidirectional attenuation performance while also reducing design time.

bidirectional attenuation controllight deflection angledata fittingoptical design

卢帅、曲贺盟、管海军、张继真、王超、谢晓麟、王宁

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中国科学院长春光学精密机械与物理研究所,吉林 长春 130033

中国科学院大学,北京 100049

应用光学国家重点实验室,吉林 长春 130033

光学系统先进制造重点实验室(中国科学院),吉林 长春 130033

长春长光智欧科技有限公司,吉林 长春 130102

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二向衰减控制 光线偏折角 数据拟合 光学设计

2024

光学学报
中国光学学会 中国科学院上海光学精密机械研究所

光学学报

CSTPCD北大核心
影响因子:1.931
ISSN:0253-2239
年,卷(期):2024.44(21)