Preparation and Study of Self-Assembled Nanostructured Arrays Photodetector
In order to avoid the time-consuming,expensive equipment and complicated steps of traditional lithography and to solve the neck-pinching technical problems in the field of microelectronics fabrication,liquid-surface self-assembled polystyrene(PS)nanosphere is utilized to prepare nanostructured arrays in this paper.Low-cost,large-area,size-controllable nanostructured arrays on n-type silicon substrates are successfully prepared and successfully employed to photodetector.It is shown that the introduction of nanostructures can effectively improve the anti-reflective property of silicon surface,and the reflectivity is reduced by up to about 96%compared with that of planar silicon.The light/dark current ratio of the nanostructured device approximately reached one order of magnitude.At+5 V bias,the responsivity of the nanostructured photodetector is improved by 10.1-fold and 3.7-fold compared with that of the planar one at the wavelengths of 365 nm and 405 nm,respectively.At+5 V bias,the external quantum efficiency(EQE)of the nanostructured photodetector is 10.1 times higher than that of the planar one at 365 nm and 3.7 times higher at 405 nm.This provides a low-cost,efficient,reliable and simple way to prepare high-performance nanostructured optoelectronic devices.
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