首页|钨镍共掺杂V2O5薄膜的光电特性研究

钨镍共掺杂V2O5薄膜的光电特性研究

Preparation of tungsten-nickel co-doped V2O5 films by sol-gel method and photoelectric properties of thermally induced phase transition

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利用溶胶-凝胶旋涂法和后退火工艺在FTO导电玻璃上制备了钨镍共掺杂V2O5 薄膜,研究了薄膜在不同温度和不同偏压下的光电特性和相变特性.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和X射线光电子能谱仪(XPS)测试了钨镍共掺杂V2O5 薄膜的晶体结构、表面形貌和组分,分析了不同钨镍共掺杂浓度对V2O5 薄膜相变光电特性的影响.结果表明,当钨和镍的掺杂质量分数分别为 3%和 1.5%时,钨镍共掺杂的V2O5 薄膜的相变温度为218.5℃,在可见光范围内有较高的透过率,在近红外 1310 nm波长处的光学透过率达48.83%,与未掺杂V2O5 薄膜的光学透过率相比提高了 10.29%,薄膜电阻降低了 30.53%,热致回线宽度收窄为 15℃,说明钨镍共掺杂的V2O5 薄膜具有良好的可逆相变光电特性,有望在新型光电器件领域得到较好的应用.
In this paper,tungsten-nickel co-doped V2O5 films were prepared on FTO conductive glass by using sol-gel spin coating and annealing to study their photoelectric and phase transition properties at different temperatures and different bias voltage.The crystal structure,surface morphology and components of tungsten-nickel co-doping V2O5 films were tested by XRD,SEM and XPS to analyze the effects of different tungsten-nickel co-doping concentrations on the phase transition photoelectric properties of V2O5 films.The results show that when the doping concentrations of tungsten and nickel were respectively 3%and 1.5%,tungsten-nickel co-doped V2O5 films had a phase transition temperature of 218.5℃,a higher transmittance in the visible light range and the transmittance of 48.83%at 1310 nm wavelength.Comparing with the undoped V2O5 films,the optical transmittance and sheet resistance of the co-doped V2O5 films increased 10.29%and decreased 30.53%,respectively,and the thermal hysteresis loop width was also narrowed to 15℃.It is expected to have better applications in the field of new optoelectronic devices based on their excellent reversible phase transition photoelectric properties.

codoping of tungsten and nickelV2O5 filmsol-gelthermotropic phase transitionoptical transmittancesheet resistance

王兴萍、李毅、庄嘉庆、闫俊屹、梅金城

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上海理工大学 光电信息与计算机工程学院,上海 200093

上海理工大学 上海市现代光学系统重点实验室,上海 200093

钨镍共掺杂 V2O5薄膜 溶胶-凝胶 热致相变 光学透过率 薄膜电阻

教育部科学技术研究重点项目上海市科学技术委员会科技攻关计划上海市教育委员会科研创新计划重点项目上海市领军人才培养计划

20703306DZ1141510ZZ942011-026

2024

10.3969/j.issn.1005-5630.202303260075

光学仪器
中国仪器仪表学会　上海光学仪器研究所　中国光学学会工程光学专业委员会

光学仪器

影响因子：0.432
ISSN：1005-5630
年,卷(期)：2024.46(3)
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