首页|氨基修饰g-C3N4材料的制备及其光催化去除U(Ⅵ)

氨基修饰g-C3N4材料的制备及其光催化去除U(Ⅵ)

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以三聚氰胺为前驱体,焙烧制得g-C3N4.g-C3N4经过与乙二胺水热反应得到氨基修饰的g-C3N4/NH2改性光催化剂.研究g-C3N4/NH2改性光催化剂对废水中U(Ⅵ)的去除能力,并采用XRD、SEM、XPS、FT-IR等技术对改性样品的形貌、结构、光催化去除U(Ⅵ)能力等进行表征.结果表明,在模拟光源下,其中加入30 mL乙二胺的样品表现出最佳性能,可以在15 min将U(Ⅵ)浓度为10 mg·L-1的U(Ⅵ)完全去除,150 min对U(Ⅵ)浓度为50 mg·L-1的U(Ⅵ)去除率达76.5%.经表面修饰的材料表现出对U(Ⅵ)溶液优异的吸附和催化性能的原因是:水热过程使g-C3N4纳米片层剥离,提高了材料的比表面积;成功引入的氨基基团使g-C3N4提高了对U(Ⅵ)的捕获能力,提高了对光生电子的利用率,进而提高了g-C3N4/NH2材料的催化性能.
Preparation of aminomodified g-C3N4 material and its photocatalytic removal of U(Ⅵ)
g-C3N4 was prepared by calcination using melamine as precursor.After the hydrothermal reac-tion of g-C3N4 with ethylenediamine,amino modified g-C3N4/NH2 photocatalyst was obtained.The removal capacity of U(Ⅵ)from wastewater by g-C3N4/NH2 modified photocatalyst has been studied,and the mor-phology,structure and photocatalytic removal capacity of the modified sample have been characterized by XRD,SEM,XPS,FT-IR.The results show that under the simulated light source,the sample with 30 mL eth-ylenediamine has the best performance,and it can effectively remove more than 99%U(Ⅵ)(10 mg·L-1)within 15 min,about 76.5%U(Ⅵ)(50 mg·L-1)within 150 min.The surface modified material shows excellent adsorption and catalytic properties for U(Ⅵ)solution due to the following reasons:the hydrothermal process can peel g-C3 N4 nanosheets,which increases the specific surface area of the material;the successful introduction of the amino group improves the capturing ability of U(Ⅵ)over g-C3N4,the utilization of photogenerated electrons,and the catalytic performance of g-C3N4/NH2 materials.

catalytic chemistryg-C3N4photocatalysisadsorptionaminoU(Ⅵ)

许兆怡、郭翔宇、丛泓昆、柳成荫、李晓强

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烟台大学环境与材料工程学院,山东烟台 264005

催化化学 g-C3N4 光催化 吸附 氨基 U(Ⅵ)

2024

工业催化
西北化工研究院

工业催化

CSTPCD
影响因子:0.504
ISSN:1008-1143
年,卷(期):2024.32(4)
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