Practical Teaching Reform on Semiconductor Device and Fundamentals of Integrated Circuit Design:Wet Etching of Si Nanowires in FETs
As one of the most fundamental and key technologies in the manufacture of silicon-based integrated circuits(IC),silicon wet etching process has been widely used in practical production.Si nanowire channel in the field-effect transistor(FET)was designed and fabricated by using the anisotropic wet etching of silicon.The practical teaching covered many important knowledge points from the course of Semiconductor Device and Fundamentals of Integrated Circuit Design,including MOSFET devices,thin film deposition,lithography,dry etching and wet etching,and so on.The integrated teaching mode in which theory and practice promoted each other can deepen students'understanding of professional theoretical knowledge,improve students'engineering practice ability,and help students understand the frontier of science and then stimulate their interest in scientific research.
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