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O波段硅基二氧化硅密集波分复用AWG设计及制备

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O波段波分复用器是数据中心高速互连关键器件,采用相对折射率差为0。75%的硅基二氧化硅光波导材料,设计并制备了 O波段48通道平顶型密集波分复用阵列波导光栅芯片,采用金属合金架固定阵列波导光栅芯片,金属螺杆随温度变化收缩或伸张,可补偿阵列波导光栅芯片响应谱波长随温度产生的飘移,实现-5 ℃到65 ℃温度范围内响应谱稳定输出,采用非归零和4电平信号两种调制方式进行高速信号传输。测试结果表明,封装后的阵列波导光栅的插入损耗在-5。31~-6。59 dB之间,通道间隔0。676 nm,1 dB、3 dB带宽分别为0。41 nm、0。55nm,相邻串扰、非相邻串扰分别为29。4 dB、29。2 dB,偏振相关损耗小于0。67 dB,5 ℃到65 ℃变温下中心波长漂移由7 pm/℃减小到0。6 pm/℃,26。56 Gbps非归零及53。12 Gbps 4电平信号调制传输眼图消光比分别大于5。5 dB和3。6dB。
Design and Fabrication of O-band Silicon-based Silicon Dioxide Dense Wavelength-division Multiplexing AWG
The O-band wavelength division multiplexer is a key component for high-speed interconnection in data centers.Thin film filters and array waveguide gratings are two commonly used technical solutions.The silica based array waveguide grating wavelength division multiplexer has the advantages of low loss and integration,becoming the main technology of data center wavelength division technology.This article adopts a silica based optical waveguide material with a relative refractive index difference of 0.75%.Based on the diffraction equation,an O-band 48 channel,120 GHz channel spacing flat top dense wavelength division multiplexing array waveguide grating chip is designed,with a single-mode waveguide cross-section of 6 μm×6 μm.Using the beam propagation method,the effective refractive index of the flat waveguide at the center wavelength was calculated to be 1.456 4,the effective refractive index of the array waveguide was 1.454 4,the group refractive index was 1.474 7,and the spacing between the array waveguides was selected to be 8 μm.The output waveguide spacing is 26 μm.The diffraction order is 31,and the difference in length between adjacent array waveguides is 27.708 μm.The focal length of Rowland circle is 14 256.97 μm.The number of waveguide arrays is 401,and the designed chip size is 4.4 cmX 3 cm.The AWG preparation adopts a planar optical path integration process,and the silicon substrate undergoes silicon thermal oxidation at 1 050 ℃ to form 20 μm-thick SiO2 lower cladding,followed by growth of 6 μm GeO2-SiO2 core layer using Plasma Enhanced Chemical Vapor Deposition(PECVD)technology.Using contact exposure lithography technology and inductively coupled plasma etching technology to achieve good pattern transfer.Subsequently,20 μm boron phosphorus silicate glass undercladding is formed through PECVD,which the refractive index is consistent with that of the lower layer SiO2.The wafer is cut and polished to an angle of 8° on the end face to reduce return loss.Place the AWG chip on an alloy material rack and cut a slot at a specific part of the AWG input Rowland circle.The input and output waveguides are coupled with the fiber array respectively.Adjust the metal screw on the alloy rack to ensure that the central wavelength is at the International Telecommunication Union(ITU)wavelength.The metal screw contracts or extends with temperature changes,pushing the input Rowland circle up and down to compensate for the drift of the AWG chip's response spectrum wavelength due to temperature,stable response spectrum was achieved within the temperature range of-5 ℃ to 65 ℃.Using an O-band tunable laser,polarization controller,and power detector,the output spectrum of the packaged AWG module was tested.The insertion loss was between-5.31 dB and-6.59 dB,with a channel spacing of 120 GHz.The 1 dB and 3 dB bandwidths were 0.41 nm and 0.55 nm,respectively.Adjacent crosstalk and non-adjacent crosstalk were 29.4 dB and 29.2 dB,respectively,and polarization related loss was less than 0.67 dB.Using a temperature controller to change the ambient temperature of the AWG module,within the temperature range of-5 ℃ to 65 ℃,the center wavelength drift was reduced from 7 pm/℃ to 0.6 pm/℃,demonstrating good temperature stability.Using an error code analyzer,lithium niobate modulator,and sampling oscilloscope,high-speed signal transmission was carried out for two modulation methods of Non Return to Zero(NRZ)and 4 Pulse Amplitude Modulation(PAM-4)signals in the AWG module.The results showed that the modulation transmission eye diagrams of 26.56 Gbps non zero and 53.12 Gbps 4-level signals were clear,with extinction ratios greater than 5.5 dB and 3.6 dB,respectively,and the total transmission capacity of 48 channels reached 2.4 Tbps.

Arrayed waveguide gratingsDense wavelength division multiplexingData centerSilica-based waveguideNon return to zero modulation4 pulse amplitude modulation

韩凤、张家顺、王亮亮、崔鹏伟、王玥、安俊明、陈军、孙冰丽、周天红

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集宁师范学院物理与电子信息工程学院,乌兰察布 012000

中国科学院半导体研究所光电子材料与器件重点实验室,北京 100083

中国科学院大学材料科学与光电技术学院,北京 100049

河南仕佳光子科技股份有限公司河南省光电芯片与集成重点实验室,鹤壁 458030

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阵列波导光栅 密集波分复用 数据中心 二氧化硅波导 非归零调制 4电平调制

中国科学院战略性先导科技专项(B类)国家重点研发计划

XDB430000002018YFA0306403

2024

光子学报
中国光学学会 中国科学院西安光学精密机械研究所

光子学报

CSTPCD北大核心
影响因子:0.948
ISSN:1004-4213
年,卷(期):2024.53(8)