新型锑氧簇光刻胶的性能与机理研究
Performance and mechanism of novel antimony oxo cluster photoresist
司友明 1郑凌峰 1陈鹏忠 1樊江莉 1彭孝军1
作者信息
- 1. 大连理工大学智能材料化工前沿科学中心,精细化工国家重点实验室,辽宁 大连 116024
- 折叠
摘要
随着半导体行业集成度越来越高,对光刻材料提出了更高的要求.近年来,金属氧簇光刻胶由于尺寸小、结构设计灵活,得到了广泛的研究.目前锑基金属光刻胶仅局限于含锑配合物.开发出新型锑氧簇光刻胶,通过对比金属有机组装Sb4O-1与自组装Sb4O-2的溶解度差异说明自组装策略优势.原子力显微镜证实Sb4O-2光刻胶可形成光滑薄膜,并获得低粗糙度值(均方根粗糙度＜0.3 nm).电子束光刻(EBL)证明Sb4O-2光刻胶优异的图案化能力(线宽＜50 nm),理论计算支持X射线光电子能谱(XPS)分析的新型自组装Sb4O-2"配体解离"机制.
Abstract
With the increasing integration of semiconductor industry,higher requirements are put forward for lithographic materials.In recent years,metal-oxygen oxo clusters(MOCs)photoresists have been widely studied due to the small size and flexible structure design.At present,antimony-based photoresistsare limited to antimony-containing complexes.In this paper,a novel antimony-oxygen oxo cluster photoresist was developed,and the advantages of the self-assembly strategy was demonstrated by comparing the solubility difference between metal-organic assembled Sb4O-1 and self-assembled Sb4O-2.Atomic force microscopy(AFM)confirmed that Sb4O-2 photoresists can form smooth films with a low roughness value(root mean square roughness＜0.3 nm).Electron beam lithography(EBL)demonstrated the excellent patterning ability of Sb4O-2 photoresist(line width＜50 nm),and theoretical calculations supported a novel self-assembled Sb4O-2"ligand dissociation"mechanism analyzed by X-ray photoelectron spectroscopy(XPS).This work inspired the exploration of additional metal oxygen oxo cluster materials.
关键词
锑氧簇/自组装/光刻胶/理论计算/电子束光刻/成像/溶解性/纳米材料Key words
antimony oxo cluster/self-assembly/photoresist/theoretical calculations/electron beam lithography/imaging/solubility/nanomaterials引用本文复制引用
基金项目
国家自然科学基金(21925802)
国家自然科学基金(22338005)
辽宁滨海实验室项目(LBLB-2023-03)
中央高校基本科研业务费专项(DUT22LAB601)
出版年
2024
国家科技期刊平台
NSTL
万方数据