光助漂浮型铜钼双金属氮化碳复合材料活化PMS去除水中抗生素抗性菌与抗性基因的性能及机理
Study on the performance and mechanism of ARB and ARGs removal in wastewater by Vis/Cu0-MoS2/C3N4-EG enhanced peroxymonosulfate activation process
陈曦 1刘熠阳 1周见卓 1王官禄 1王学江1
作者信息
- 1. 同济大学环境科学与工程学院,污染控制与资源化研究重点实验室,上海 200082
- 折叠
摘要
通过光还原法制备了一种漂浮型Cu0和MoS2双金属氮化碳复合材料Cu0-MoS2/C3N4-EG,构建了可见光助Cu0-MoS2/C3N4-EG活化PMS体系(Vis/Cu0-MoS2/C3N4-EG/PMS)用于去除水中抗生素抗性菌(ARB)和抗性基因(ARGs).灭菌实验结果表明,Vis/Cu0-MoS2/C3N4-EG/PMS体系在材料投加量为0.22 g·L-1,PMS浓度为1 g·L-1时,仅需0.5 min即可灭活全部TC-ARB(初始浓度为5.4×107 CFU·mL-1).灭菌过程能够破坏细胞膜的结构,进而导致DNA片段泄露并受到ROS的攻击,使得ARGs的水平转移频率降低;淬灭实验和ESR实验结果表明,起主要作用的活性物质是·OH、·SO4-和1O2.Vis/Cu0-MoS2/C3N4-EG/PMS体系对实际污水处理厂二沉池出水消毒处理结果表明,该体系能够在2 min内完成高效消毒,并且大幅降低水中各类ARGs的绝对丰度.研究结果为TC-ARB及其ARGs污染的同步高效去除提供了技术支撑和理论依据.
Abstract
In this study,a floating copper-molybdenum bimetallic carbon nitride composite Cu0-MoS2/C3N4-EG was synthesized.A visible-light-assisted Cu0-MoS2/C3N4-EG activated PMS system(Vis/Cu0-MoS2/C3N4-EG/PMS)was developed for the removal of antibiotic-resistant bacteria(ARB)and antibiotic resistance genes(ARGs)from water.The results showed that this system could inactivate all tetracycline-resistant antibiotic-resistant bacteria(TC-ARB)within only 0.5 min,starting from an initial concentration of 5.4×107 CFU·mL-1,using a catalyst dosage of 0.22 g·L-1 and PMS dosage of 1 g·L-1.This system could destroy the cell membrane of TC-ARB,with the leaked DNA fragments further attacked by reactive oxygen species(ROS),which significantly reduce the horizontal transfer of TC-ARGs.Quenching test and electron paramagnetic resonance(EPR)analyses showed that the main active species included·OH,·SO4-and 1O2.For secondary effluent from an actual sewage treatment plant,this system achieved efficient disinfection within 2 minutes and greatly reduce the absolute abundance of various ARGs in the water.This study provide technical support and theoretical basis for the removal of TC-ARB and ARGs from whater.
关键词
过硫酸盐活化/双金属催化剂/抗生素抗性基因/可见光/氮化碳Key words
persulfate activation/bimetallic catalysis/antibiotics resistance genes/visible light/carbon nitride引用本文复制引用
出版年
2025
NETL
NSTL
万方数据