首页|多层复合ZnS/Cu/Ag/ZnS透明导电薄膜的磁控溅射制备及性能研究

多层复合ZnS/Cu/Ag/ZnS透明导电薄膜的磁控溅射制备及性能研究

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采用磁控溅射法制备ZnS/Cu/Ag/ZnS多层复合透明导电薄膜,并对其微观结构和光电性能进行研究.选用纯度>99.99%的ZnS、Cu和Ag靶材,分别利用射频和直流溅射电源,在玻璃衬底上逐层溅射沉积了不同膜层参数的ZnS/Cu/Ag/ZnS结构薄膜.利用扫描电子显微镜、原子力显微镜、X射线衍射仪、紫外可见分光光度计和四探针测试仪等对复合薄膜的形貌、物相、透光性和导电性进行测试.优化后的复合薄膜显示出均匀的界面组织,优良的透光性和导电性,400-800 nm可见光波段的平均透射率为 87.47%,表面电阻为 6.74 Ω/sq,品质因子达 38.91×10-3Ω-1.该复合透明导电薄膜具有优良的综合光电性能,为无铟透明导电膜的产业应用和拓展提供了更多选项.
Research on Preparation and Properties of Transparent and Electrical Conductive ZnS/Cu/Ag/ZnS Multilayer Film by Magnetron Sputtering
The ZnS/Cu/Ag/ZnS multilayer transparent conductive film was prepared by magnetron sputtering technique,the corresponding microstructure and optoelectrical properties were analyzed.The targets of ZnS,Cu and Ag with purity>99.99 wt.%were adopted as raw materials,radio frequency power and direct current power were selected to deposit each layer sequentially with varied depth values.The microstructure,phase constituent and optoelectrical properties were studied via the scanning electronic microscope,atom force microscope,X-ray diffractometer,ultraviolet and visible spectrophotometer and four-point probe.The ZnS/Cu/Ag/ZnS film possesses homogeneous morphology,good light transmission and electrical conductivity.The optimal value is 87.47%for the average light transmittance(400-800 nm),6.74 Ω/sq for the sheet resistance and 38.91×10-3Ω-1 for the Figure of Merit.The indium-free composite film with excellent optoelectrical properties offers extra choice for corresponding industrial applications.

transparent conductive filmmultilayer structuremagnetron sputteringdielectric layerseed layer

陶凯、李豫博、王煜昊、郭凯洋、李青萍、丁海

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河南工学院 材料科学与工程学院,河南 新乡 453003

河南省金属材料改性技术工程技术研究中心,河南 新乡 453003

宇通客车股份有限公司,河南 郑州 450000

透明导电薄膜 多层结构 磁控溅射 介质层 种子层

河南省科技攻关项目河南工学院博士科研基金项目

232102231016KQ1851

2024

河南工学院学报
河南机电高等专科学校

河南工学院学报

影响因子:0.182
ISSN:2096-7772
年,卷(期):2024.32(4)