首页|钽阳极块表面氧化膜晶化机理研究

钽阳极块表面氧化膜晶化机理研究

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随着钽电容器高比容化和小型化的发展,15 000~20 000 μFV/g比容的片式钽粉已被电容器厂家投入生产并使用.本研究通过两种不同粉末制备的的烧结块SEM、颗粒强度、粒度分布、孔隙度、烧结曲线等的测试结果进行分析对15 000~20 000 μFV/g比容的片式钽粉的制备提出了新的要求和建议.
Crystallization Mechanism of Oxide Film on Tantalum Anode Surface
With the development of high specific capacitance and miniaturization of tantalum capacitors,flake tantalum powder of 15 000~20 000 μFV/g specific capacitance has been put into production and used by capacitor manufacturers.Based on the analysis of the results of SEM,particle strength,particle size distribution,porosity and sintering curve of two different powders,new requirements and suggestions for the preparation of 15 000~20 000μFV/g specific volume chip tantalum powder were put forward.

tantalum anode blockSEMparticle strengthparticle size distributionporositysintering curve

杨国启、王刚、黄俊、华浩东、邓凯迪、沈建华、邓俊涛、潘齐凤、张波

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中国振华(集团)新云电子元器件有限责任公司,贵州贵阳 550018

贵州振华电子信息产业技术研究有限公司,贵州贵阳 550018

钽阳极块 SEM 颗粒强度 粒度分布 孔隙度 烧结曲线

2024

湖南有色金属
湖南有色金属研究院,湖南有色金属学会

湖南有色金属

影响因子:0.393
ISSN:1003-5540
年,卷(期):2024.40(2)
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