利用Batch Implant机台离子注入dose梯度分布调控注入均匀性的技术分析
Analysis of Regulate Implant Uniformity by Improving the Dose Gradient Distribution of Batch Implant Tool
庞宏庄 1国子明1
作者信息
- 1. 上海华虹宏力半导体制造有限公司,上海 201203
- 折叠
摘要
阐述发现batch implant机台所作业的wafer状况,在wafer面内存在规律性梯度差异的dose分布.基于wafer processing过程中的形变现象,通过fine tune beam line及优化diskangle条件,可以定量设计dose梯度分布情况.通过优化离子注入在wafer面内分布的dose对称性,可以有效改善离子注入均匀性.
Abstract
This paper describes regular dose gradient distribution in plane of a wafer which was processed by batch implant tool.Base on the shape change in a processing wafer,if fine tune beam line and optimize the disk angle condition,will quantitative design the dose gradient distribution.What's better,the implant uniformity may be enhanced with an appropriate dose symmetry.
关键词
集成电路制造/dose梯度/Dose对称性/离子注入均匀性Key words
integrated circuit manufacturing/Dose gradient/dose symmetry/dose uniformity引用本文复制引用
出版年
2024
NETL
NSTL
万方数据