Analysis of Regulate Implant Uniformity by Improving the Dose Gradient Distribution of Batch Implant Tool
This paper describes regular dose gradient distribution in plane of a wafer which was processed by batch implant tool.Base on the shape change in a processing wafer,if fine tune beam line and optimize the disk angle condition,will quantitative design the dose gradient distribution.What's better,the implant uniformity may be enhanced with an appropriate dose symmetry.
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