Application of Nitrogen-containing Heterocyclic Corrosion Inhibitor in PCMP Solution
This paper describes the effects of different corrosion inhibitor formulations on the surface corrosion inhibition of copper dummy,and assists in the comparative analysis of the corrosion rates of different inhibitors at different temperatures,times,and concentrations.It preliminarily proposes the advantages of formulations containing nitrogen based corrosion inhibitors.Secondly,compare the cleaning effects,surface roughness,and impact on the surface scratches of cleaning brushes PVA(polyvinyl alcohol material)with different sustained-release agent formulations,and further verify that PCMP samples containing nitrogen-containing base corrosion inhibitors exhibit the best performance under alkaline conditions.It can clean the copper layer on the surface of the wafer and effectively inhibit copper surface corrosion,reduce surface roughness,and extend the Q-Time(intermediate residence time in the process).Finally,the conclusion that Cu2O can effectively prolong the Q-time was brief verified through SP2 and XPS characterization analysis by the PCMP treated wafer surface.
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