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光刻制程中的核心工艺技术综述

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阐述光刻制程的核心工艺技术,分析各工艺步骤特点及异常情况,包括气相成底膜、涂布、前烘、曝光、曝光烘烤、显影、硬烘、检验工序,为未来进一步工艺研究与生产制造提供理论依据.
Overview of Core Process Technologies in Photolithography Process
This paper describes the core process technology of photolithography,analyzes the characteristics and abnormal situations of each process step,including gas-phase film formation,coating,pre drying,exposure baking,development,hard drying,and inspection processes.It provides a theoretical basis for further process research and production manufacturing in the future.

integrated circuitslithography processgluingdevelopmentbaking

曲征辉

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沈阳芯源微电子设备股份有限公司,辽宁 110001

集成电路 光刻工艺 涂胶 显影 烘烤

2024

集成电路应用
上海贝岭股份有限公司

集成电路应用

影响因子:0.132
ISSN:1674-2583
年,卷(期):2024.41(3)
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