Analysis of Real-time Feedback Technology of High-Order Parameters for Optimizing Etching Errors
This paper expounds the commonly used analytical models for offset error compensation and introduces that mounting high-order offset sub prescription(EEXY)is currently the main form of high-order parameter compensation implemented on lithography machines.It compares the impact of ASML LIS based EEXY real-time feedback(LIS Run to Run)with traditional APC based linear 10 parameter real-time feedback,as well as the commonly used 10par Run to Run+static EEXY feedback method in advanced nodes on the etching error.Analysis shows that real-time feedback of high-order etching parameters significantly improves the etching error in both the X and Y directions compared to the other two schemes.
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