首页|光刻机光源系统中的波长控制与稳定性改进

光刻机光源系统中的波长控制与稳定性改进

扫码查看
阐述为改进机台光源系统中的波长控制与稳定性,通过完善现有光源系统,优化波长调节和稳定技术,并进行实验验证,探讨可行的解决方案.该方案包括理论分析、光学设计和波长调节实验.
Analysis of Wavelength Control and Stability Improvement in Machine Light Source Systems
This paper describes the improvement of wavelength control and stability in the machine light source system.By improving the existing light source system,optimizing wavelength adjustment and stability technology,and conducting experimental verification,feasible solutions are explored.This plan includes theoretical analysis,optical design,and wavelength adjustment experiments.

integrated circuitlithography machinelight source systemwavelength control

董佳、余洋

展开 >

上海集成电路装备材料产业创新中心有限公司,上海 201800

集成电路 光刻机台 光源系统 波长控制

2024

集成电路应用
上海贝岭股份有限公司

集成电路应用

影响因子:0.132
ISSN:1674-2583
年,卷(期):2024.41(5)