Analysis of the Structure of One Step Etching in MIM Capacitor Upper and Lower Plates
This paper describes the physical structure of a capacitor with a relatively small upper plate and a larger lower plate area etched in one step through a dry etching process under a photomask.Compared to the traditional method of forming upper and lower layer structures with different areas through two photomasks and two dry etching processes,the new one-step etching method simplifies the process flow.Through multiple experimental batches,it has been verified that the new one-step etching physical structure can achieve the same effect as the traditional structure in terms of the distance between the upper and lower plates,preventing the problem of metal splashing affecting the breakdown voltage and electrical performance during the etching process.
万方数据
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