A single crystal of potassium tantalum niobate was chosen to deposit high quality diamond thin films by mi-crowave plasma chemical vapor deposition(MPCVD)techniques.The surface morphologies and microstructures of the as-deposited diamond films were characterized by XRD,SEM,and Raman spectroscopy.The photocatalytic properties of the samples were studied.A TaC transition layer was identified during the deposition of diamond.Additionally,it was observed that as the deposition time prolonged,the quality of the diamond film improved.All film samples showed good ability to degrade Rhodamine B,with the degradation rate of the film deposited for 12 h being 0.29 times higher,corresponding to a 1.6 times greater degrading speed of Rhodamine B compared to the film deposited for 3 h.This re-search introduces a novel substrate for depositing polycrystalline diamond and explores its application in photocatalysis.
关键词
金刚石/铌酸钽钾/光催化/微波等离子体化学气相沉积(MPCVD)
Key words
diamond/potassium tantalum niobate/photocatalysis/micro-plasma chemical vapor deposition(MPCVD)
维普
万方数据