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基于光学显微视觉的精密定位测量综述(特邀)

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精密定位测量旨在针对微动目标实现微纳米精度的定位与小尺度操纵,其作为一种重要的测量技术,在工业生产、半导体制造等高端装备领域得到广泛应用。与其他测量方法不同,光学显微视觉测量技术因具备交互性强、扩展性强的特征而广泛应用于精密测量中。对基于光学显微视觉的精密定位测量技术进行分析与综述。首先,介绍光学显微视觉系统的成像模型与工作原理。其次,根据是否基于标靶图案的特征,对显微定位测量算法进行分类;同时,根据标靶图案的周期特征进行进一步的分类与探究,讨论其在不同标靶图案下的性能指标。最后,总结光学显微视觉定位测量方法在不同领域的应用与前景。该综述旨在为研究人员提供关于光学显微视觉精密定位测量技术的发展状态与趋势,促进微纳尺度定位测量技术的发展。
Review of Optical Microvision-Based Precision Positioning Measurement(Invited)
Precision positioning measurements are performed to achieve micro-and nano-accuracy in positioning and small-scale manipulation for microscale objects.This technology plays a crucial role in various high-end industries,including industrial production and semiconductor manufacturing.Owing to their versatility and interactive capabilities,optical microvision-based measurement techniques are widely employed in precision positioning.This paper presents an analysis and synthesis of precision positioning measurement techniques based on optical micro vision.First,we introduced the imaging models and operational principles of optical micro-vision systems.Then,microlocalization measurement algorithms were categorized based on their reliance on target patterns.Additionally,these algorithms were classified and explored based on the periodic characteristics of target patterns.Moreover,the performance metrics of positioning measurement algorithms for different target patterns were discussed.Finally,the applications and future prospects of optical microvision-based precision positioning measurement methods across various domains were summarized.This review provides researchers insights into the current state and emerging trends in optical microvision-based precision positioning measurement technology,thereby advancing the field of microscale/nanoscale positioning measurement.

optical systemprecise positioning measurementmicro visionmicro-nano scale

赵晨阳、向捷、卞凯、朱子健、万庆红

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哈尔滨工业大学(深圳)机电工程与自动化学院,广东 深圳 518057

光学系统 精密定位测量 显微视觉 微纳尺度

国家自然科学基金中国科协青年精英科学家资助计划

52005135YESS20210161

2024

激光与光电子学进展
中国科学院上海光学精密机械研究所

激光与光电子学进展

CSTPCD北大核心
影响因子:1.153
ISSN:1006-4125
年,卷(期):2024.61(2)
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