激光与光电子学进展2024,Vol.61Issue(9) :283-287.DOI:10.3788/LOP223368

基于电喷墨技术的多焦距曲面微透镜阵列制备

Multi-Focal-Length Curved Microlens Array Based on Electric Inkjet Technology

褚金奎 刘瑞 刘建英 付佳新
激光与光电子学进展2024,Vol.61Issue(9) :283-287.DOI:10.3788/LOP223368

基于电喷墨技术的多焦距曲面微透镜阵列制备

Multi-Focal-Length Curved Microlens Array Based on Electric Inkjet Technology

褚金奎 1刘瑞 1刘建英 1付佳新1
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作者信息

  • 1. 大连理工大学机械工程学院,辽宁 大连 116023
  • 折叠

摘要

随着微纳米工艺的发展,微光学元件的制备和应用成为重要研究方向.生物复眼具有视场大、体积小、动态特性好等优点.微透镜阵列是一种常用的仿生复眼的光学元件,具有广泛的应用场景.为此,提出了一种基于电喷墨打印技术制备多焦距的曲面微透镜阵列的工艺,所制备的多焦距微透镜阵列可以解决曲面基底和平面的图像传感器焦距不匹配引起的离焦模糊问题.首先基于电喷印技术制备平面的多焦距微透镜阵列,然后在表面形成抗粘层并倒模,得到微透镜阵列凹模,最后经负压弯曲注胶固化过程,制备了多焦距的曲面微透镜阵列.阵列的整体半径为6 mm,焦距范围为4.9~6.23 mm,总方向角大于60°.

Abstract

With the advancements of micro and nanotechnology,the preparation and application of micro-optical components have become hot research topics.Biological compound eyes have the advantages of a large field of view,small size,and good dynamic characteristics.Hence,a microlens array,which is a commonly used bionic compound eye optical element,has a wide range of applications.Herein,an electroinkjet printing-based process is proposed to prepare a multi-focal-length curved microlens array to resolve the problem of out-of-focus blur caused by a mismatch between the focal length of the curved substrate and the plane image sensor.A planar multi-focal-length microlens array was prepared based on electrojet printing,and then the antistick treatment and inverted mold were used to obtain the lens die.Finally,a multi-focal-length curved microlens array with an overall radius of 6 mm was prepared via negative pressure bending and glue injection.The array has a focus range of 4.9‒6.23 mm and the total direction angle is larger than 60°.

关键词

集成光学器件/多焦距曲面微透镜阵列/电喷墨技术

Key words

integrated optics devices/multi-focal-length curved microlens array/electric inkjet technology

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基金项目

国家自然科学基金(52175265)

国家自然科学基金(51675076)

国家自然科学基金(52275281)

创意研究小组科学基金(51621064)

中央高校基本科研业务费专项(DUT21ZD101)

中央高校基本科研业务费专项(DUT21GF308)

中央高校基本科研业务费专项(DUT20LAB303)

出版年

2024
激光与光电子学进展
中国科学院上海光学精密机械研究所

激光与光电子学进展

CSTPCDCSCD北大核心
影响因子:1.153
ISSN:1006-4125
参考文献量6
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