首页|Fabrication of Conductive Domain Walls in x-cut Congruent Thin-film Lithium Niobate Using an Electrical-field Poling Technique(Invited)

Fabrication of Conductive Domain Walls in x-cut Congruent Thin-film Lithium Niobate Using an Electrical-field Poling Technique(Invited)

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Conductive ferroelectric domain walls have attracted increasing research interest in the field of nanoelectronics,and the fabrication technique for such domain walls is vital.In this study,we investigated in detail the fabrication of conductive domain walls in x-cut congruent thin-film lithium niobate(TFLN)using an electrical-field poling technique.The ferroelectric domain structures can be controlled through the applied electrical field and applied pulse numbers,and the domain inversion process is related to the conduction characteristics of the domain walls.The domain structures in TFLN are revealed using confocal second-harmonic microscopy and piezoresponse force microscopy.The results provide further directions for the development and application of conductive domain walls in TFLN.

thin-film lithium niobateelectric field polinghead-to-head/tail-to-tail domainconduction characteristics of domain wall

Su Yawen、Chen Haiwei、Zhao Mengwei、Niu Yunfei、Li Chen、Zhang Yong、Yang Shaoguang、Zhu Shining、Hu Xiaopeng

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National Laboratory of Solid State Microstructures,School of Physics,College of Engineering and Applied Sciences,Nanjing University,Nanjing 210008,Jiangsu,China

Zhejiang Laboratory,Hangzhou 311121,Zhejiang,China

国家重点研发计划国家重点研发计划国家重点研发计划国家自然科学基金国家自然科学基金国家自然科学基金国家自然科学基金国家自然科学基金江苏省前沿引领技术基础研究专项

2022YFA12051002022YFF07128002019YFA07050009216321692150302622881011230443212192251BK20192001

2024

激光与光电子学进展
中国科学院上海光学精密机械研究所

激光与光电子学进展

CSTPCD北大核心
影响因子:1.153
ISSN:1006-4125
年,卷(期):2024.61(11)