首页|高反射率法布里-珀罗干涉腔平面镜设计及太赫兹波长测量

高反射率法布里-珀罗干涉腔平面镜设计及太赫兹波长测量

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波长是太赫兹源的关键参数,法布里-珀罗(F-P)干涉法是太赫兹源波长测量的主要方法之一。采用高阻硅片作为干涉腔平面反射镜存在反射率低、适用频段窄和条纹精细度低等问题,无法满足波长高精度测量需求。通过在高阻硅片上镀周期性金属网栅的方式,设计加工了一组0。08~0。53 THz频段反射率在87%以上的干涉腔平面反射镜,搭建的F-P干涉仪对0。096 THz、0。14 THz雪崩源和0。315 THz肖特基源的波长进行了测量并获得了理想的测量结果,波长测量误差分别为0。16%、0。33%和0。54%。与高阻硅片的测量结果进行对比,干涉条纹精细度和透射峰半峰全宽得到了显著的提升。该金属网栅结构简单,便于加工制作,对于提高太赫兹波长测量精度和其他相关太赫兹器件研制具有重要参考意义。
Design of High-Reflectance Fabry-Perot Interference-Cavity Plane Mirror and Measurement of Terahertz Wavelength
Wavelength is a crucial parameter for terahertz sources,and the Fabry-Perot(F-P)interferometric method is the preferred approach for measuring terahertz-source wavelengths.However,employing a high-resistance silicon wafer as the interference-cavity plane mirror presents challenges such as low reflectivity,a narrow applicable frequency band,and imprecise stripe precision;consequently,the demands of high-precision wavelength measurements cannot be satisfied.Hence,a series of interference chamber silicon-grid plane mirrors,which comprises high-resistance silicon wafers plated with a periodic metal grid,were designed and processed.These mirrors demonstrate a reflectivity exceeding 87%in the 0.08‒0.53 THz band.The F-P interferometer successfully measures the wavelengths of 0.096 THz/0.14 THz avalanche sources and a 0.315 THz Schottky source,where optimal measurement results are yielded with wavelength errors of 0.16%,0.33%,and 0.54%,respectively.Compared with measurements using high-resistance silicon wafers,this approach significantly improves the interference stripe precision and the half-peak width of the transmission peak.The simplicity of the structure facilitates ease of fabrication,thus contributing significantly to advancements in terahertz-wavelength measurement accuracy and related terahertz devices.

terahertz wavelengthFabry-Perot interferencemetal gridfinenesshigh reflectivity

廖文焘、金尚忠、李宏光、郭宇烽、解琪

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中国计量大学光学与电子科技学院,浙江 杭州 310018

西安应用光学研究所,陕西 西安 710065

太赫兹波长 法布里-珀罗干涉 金属网栅 精细度 高反射率

2024

激光与光电子学进展
中国科学院上海光学精密机械研究所

激光与光电子学进展

CSTPCD北大核心
影响因子:1.153
ISSN:1006-4125
年,卷(期):2024.61(21)