首页|超声辅助激光抛光氧化锆陶瓷实验研究

超声辅助激光抛光氧化锆陶瓷实验研究

Experimental Study on Ultrasonic-Assisted Laser Polishing of Zirconia Ceramics

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为了研究超声振动物理场对激光抛光的辅助作用,并分析超声振幅和激光参数对氧化锆陶瓷表面粗糙度的影响,本研究基于响应曲面实验设计,以表面粗糙度为优化目标,利用脉冲激光器对氧化锆陶瓷进行抛光处理,并研究抛光后材料的表面粗糙度、硬度、摩擦磨损系数,以及表面元素的变化.结果表明,超声辅助激光抛光氧化锆陶瓷的最佳工艺参数如下:激光功率为75.9 W,脉冲频率为3.28 kHz,扫描速度为345 mm/s,超声振幅为25%,振动频率为19.42 kHz.采用脉冲激光器抛光,可将表面粗糙度从2.479 μm降至0.595 μm;采用超声振动物理场辅助激光抛光,可将粗糙度进一步降至0.477 μm,总降低率达80.7%.同时,超声振动作用会使重熔层产生残余压应力,且超声辅助激光抛光所产生的竖向裂纹宽度要略窄于激光抛光所产生的竖向裂纹宽度.相比于激光抛光表面,超声辅助激光抛光表面硬度略有提高,但表面元素含量几乎没有太大变化.
This study examines the auxiliary effects of an ultrasonic vibration physical field on laser polishing and explores how ultrasonic amplitude and laser parameters influence the surface roughness of zirconia ceramics.By employing a response surface experimental design,this study aims to optimize the surface roughness.Zirconia ceramics are polished using a pulsed laser,and the study evaluates the surface roughness,hardness,friction and wear coefficients,and changes in the surface element composition.Results indicate that the optimal process parameters for ultrasonic-assisted laser polishing of zirconia ceramics are as follows:laser power is 75.9 W,pulse frequency is 3.28 kHz,scanning speed is 345 mm/s,ultrasound amplitude is 25%,and vibration frequency is 19.42 kHz.Pulsed laser polishing alone reduces the surface roughness from 2.479 to 0.595 μm.When combined with ultrasonic vibration,the surface roughness decreases further to 0.477 μm,resulting in an overall reduction of 80.7%.Additionally,ultrasonic vibration induces residual compressive stress within the remelted layer,leading to a narrower vertical crack width than that generated by laser polishing alone.Although ultrasonic-assisted laser polishing slightly increases surface hardness,it does not notably alter the content of surface elements.

ultrasonic-assisted laser polishingresponse surfacezirconiasurface roughnesslaser polishingsurface hardness

周展望、周后明、赵振宇、王超、曾俊勇

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湘潭大学机械工程与力学学院,湖南 湘潭 411105

深圳大学机电与控制工程学院,广东 深圳 518060

超声辅助激光抛光 响应曲面 氧化锆 表面粗糙度 激光抛光 表面硬度

2024

激光与光电子学进展
中国科学院上海光学精密机械研究所

激光与光电子学进展

CSTPCD北大核心
影响因子:1.153
ISSN:1006-4125
年,卷(期):2024.61(21)