Photolithography has become an important process for ultra large scale integrated circuits,and the coating process is one of the fundamental steps in lithography.The quality of the polymer material coating results determines the quality of the graphic transfer results in lithography.However,the stability and reliability of the hardware conditions of each unit of the coating and developing equipment largely determine the quality of the photolithography process results.Therefore,in order to achieve stable photolithography technology,the hardware of each unit of the coating and developing equipment must meet the necessary process technology conditions.The article takes the coating of photoresist on the surface of silicon wafers as an example to explore the influence of changes in hardware conditions within the coating unit on the thickness of photoresist films,in order to provide reference for relevant personnel.
关键词
涂胶显影设备/硬件稳定性/图形化转移/工艺技术
Key words
coating and developing equipment/hardware stability/graphical transfer/process technology
维普
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