各向异性微米级Nd-Fe-B薄膜的可控制备及磁性能
Controlled fabrication and magnetic properties of anisotropic micron-sized Nd-Fe-B films
叶智星 1余孔阳 1邵洁 1莫兆军1
作者信息
- 1. 中国科学院赣江创新研究院稀土重点实验室,江西赣州 341119
- 折叠
摘要
随着微机电系统技术的快速发展,微米级Nd-Fe-B薄膜材料在精密传感器、驱动器和执行器等设备中的应用逐渐增多.系统研究了磁控溅射沉积过程中Ar气压调控、溅射功率、沉积温度、退火温度及Nd扩散层的设计对微米级Nd-Fe-B薄膜生长、磁各向异性和矫顽力的调节作用.结果表明,适当的退火处理能够改善薄膜的微观结构,提高其垂直磁各向异性;而合理设计Nd扩散层厚度与层数的组合,有助于进一步提高薄膜的矫顽力.通过优化薄膜的制备工艺,可以有效改善微米级Nd-Fe-B薄膜的磁性能,促进了其在磁性器件中的应用.
Abstract
With the rapid development of microelectromechanical systems(MEMS)technology,micron-sized Nd-Fe-B films are increasingly used in precision sensors,actuators and drivers.In this work,we systematically investigates the effects of process parameters,including Ar gas pressure control,sputtering power,deposition temperature,an-nealing temperature,and the design of the Nd diffusion layer,on the growth,magnetic anisotropy,and coercivity of micron-sized Nd-Fe-B films.The results indicate that appropriate annealing treatment can improve the microstruc-ture of the films and enhance their perpendicular magnetic anisotropy,while the rational design of the Nd diffusion layer thickness and number combination helps further improve the coercivity.By optimizing the preparation process,the magnetic performance of micron-sized Nd-Fe-B films can be effectively enhanced,promoting their application in MEMS devices.
关键词
微机电系统/微米级Nd-Fe-B薄膜/Nd扩散/矫顽力Key words
microelectromechanical systems/micron-sized Nd-Fe-B film/Nd diffusion/coercivity引用本文复制引用
出版年
2024
NETL
NSTL
万方数据