A detailed routing algorithm is proposed to optimize the routing process in technology files with multi-ple masks.The algorithm is based on the virtual-vertex(V-V)model,which is designed to reduce the number of stitches and shorten the total length of the routing.The V-V model is constructed under a uniform grid and sup-ports both uniform and non-uniform spacing.Its size is determined by the number of masks in the layer being routed.The algorithm generates a shortest path topology structure for each network with multiple terminals and splits the network into multiple two-terminal networks.The V-V model and search algorithm are then utilized to automatically route each two-terminal network with the shortest path topology as a guide.The introduction of stitches is strictly controlled through the cost function to ensure the minimum number of stitches required to con-nect the network.Experimental results show that the proposed algorithm can reduce the number of stitches by ap-proximately 26％compared to the method of mask allocation after routing is completed.The algorithm satisfies the constraints of various masks and is proven to be effective in benchmark test sets and its derivative test cases of the detailed routing competition.
multiple maskautomatic routing of integrated circuitsV-V model
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