Fabrication of Microgrooves with High Aspect-ratio and Uniformity by Ultraviolet Nanosecond Laser
High-aspect-ratio microgrooves have been widely applied in various fields,ranging from biology to electronics.However,uniformity is still a technical challenge in the fabrication of high-aspect-ratio microgrooves.Microgrooves with high aspect-ratio and uniformity are fabricated using a 355 nm nanosecond laser by a novel multiple-scan technique.The effects of pulse energy,defocusing amount,and scan number on the depth and width of microgrooves are studied.The results indicate that a slight increase in negative defocusing amount and pulse energy can significantly increase the aspect-ratio,but too large pulse energy will lead to a decrease in uniformity.Therefore,an optimized multiple-scan strategy is proposed to fabricate microgrooves with high aspect-ratio and uniformity by combining multiple processing and defocusing laser irradiations.Microgrooves with an average aspect-ratio as high as 6.84 are achieved,while depth and width uniformity are also significantly improved.The relative standard deviations(RSDs)of depth and width are as low as 4.8%and 4.4%,respectively.Due to the high aspect-ratio and uniformity,the microgrooves are expected to find broad application in fields,such as bio-medical science,3D miniature batteries,and superhydrophobic surface.
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