Parametric unit design method for microtexture on lithographic material surfaces
Lithography process can fabricate nanoscale microtextures on product surfaces,forming rich visual effects.However,due to the complex structure and large data volume of the microtexture structures,conventional modeling methods and software are not suitable.Specific design techniques need to be developed.A parametric unit design method for lithography microtextures had been established,solving various technical issues such as meshing,micro-unit parameter mapping,generation of lithography grayscale masks,dynamic lighting simulation,and the combination of light effect curves.The key functions of modeling and rendering in microtexture design were realized.A prototype system had been developed based on vector graphic software commonly used by designers.The technical prototype of above functions was realized and a user-friendly interaction mode was constructed for designers.Application tests indicated that this methodological system could accomplish a variety of macroscopic light effect designs through function mapping and image mapping.Light effect simulation significantly improved optimization efficiency,reduced the number of samples,saved design cost,and enriched the methodological system for visual design on product surfaces.
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