Study on Technology of Mask-Less Localized Electrodeposition of Micro-Nickel Column
Mask-less localized electrodeposition technology is an advanced manufacturing method for electrochemical deposition in the way of additive manufacturing.The structure of micro-nickel column was deposited by localized electrodepositing.The depo-sition height、diameter and morphology of micro-nickel column were observed by microscope and scanning electron microscope.The average deposition rate was calculated based on measured results.A two-factor experiment was designed to investigate the ef-fects of pulse voltage、electrode gap、electrolyte concentration and additive concentration on micro-nickel column by localized elec-trodepositing.The results show that the average diameter and average deposition rate of micro-nickel column increased rapidly with the increase of pulse voltage.When pulse voltage was greater than 4.0V,the micro-nickel column became denser,but the sur-face was curved and uneven.The influence of changing electrolyte concentration is different at different pulse voltages,which mainly affects the deposition rate and surface morphology of micro-nickel column.Additive(PPS-OH)made the surface morphol-ogy of micro-nickel column smooth,and brightness increased.The average diameter of micro-nickel column decreases uniformly with the increase of additive concentration.The electrode gap mainly affects the deposition morphology and deposition rate of mi-cro-nickel column.When electrode gap is larger than 10µm,the micro-nickel column gradually became conical shape and the av-erage deposition rate obviously decreases.The micro-nickel column deposited by mask-less local electrodeposition has regular shape、uniform thickness and smooth surface when pulse voltage was 4.2V、the concentration of nickel sulfonate was 300g/L、the concentration of additive(PPS-OH)was0.5g/Land electrode gap was10µm.