研究了低压化学气相沉积法(Low-Pressure Chemical Vapor Deposition,LPCVD)制备TOPCon电池用多晶硅层的原理及优劣.TOPCon电池是一种高效率、低成本、适用于规模化生产的n型电池,其背面钝化层采用了隧穿氧化层与n型多晶硅层的叠层结构.LPCVD法作为制备TOPCon电池背面多晶硅层的一种重要方法,其工艺原理简单、成膜速率快、市场应用广,但该方法存在绕镀问题,需要复杂的绕镀清洗工艺;石英件耗材更换频繁、价格昂贵,增加了电池成本.综合计算成本结果可知,LP法相较于PECVD法,电池单瓦成本略低0.01元/W;LPCVD法相较于PVD法,电池单瓦成本略高0.003元/W.
Analysis of Polycrystalline Silicon Thin Films by LPCVD
The principle and advantages and disadvantages of preparing polycrystalline silicon layers for TOPCon batteries by using Low-Pressure Chemical Vapor Deposition(LPCVD)are studied in this article.The TOPCon battery is an n-type battery with high efficiency,low cost,and suitable for large-scale production.Its back passiv-ation layer adopts doped polycrystalline silicon films on SiOx stacks.As an important method for preparing the poly-crystalline silicon layer on the back of TOPCon battery,the LPCVD method has a simple process principle,fast film-formation rate,and wide market applications.But the method has a problem of winding plating and requires a complex winding plating cleaning process;The quartzconsumables are expensive and frequently replaced,which in-creases the cost of the battery.The comprehensive cost calculation result:The LP method has a slightly lower cost of 0.01￥/w compared to the PECVD method;LPCVD method has a slightly higher cost of 0.003￥/w compared to the PVD method.
TOPCon batteryPolycrystalline silicon layerCost per wattWinding plating
万方数据
维普
