科学通报(英文版)2024,Vol.69Issue(9) :1342-1352.DOI:10.1016/j.scib.2024.03.003

Adjustment methods of Schottky barrier height in one-and two-dimensional semiconductor devices

Jianping Meng Chengkuo Lee Zhou Li
科学通报(英文版)2024,Vol.69Issue(9) :1342-1352.DOI:10.1016/j.scib.2024.03.003

Adjustment methods of Schottky barrier height in one-and two-dimensional semiconductor devices

Jianping Meng 1Chengkuo Lee 2Zhou Li1
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作者信息

  • 1. Beijing Institute of Nanoenergy and Nanosystems,Chinese Academy of Sciences,Beijing 101400,China;School of Nanoscience and Engineering,University of Chinese Academy of Sciences,Beijing 100049,China
  • 2. Department of Electrical and Computer Engineering,National University of Singapore,Singapore 117583,Singapore;Center for Intelligent Sensors and MEMS,National University of Singapore,Singapore 117608,Singapore
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Abstract

The Schottky contact which is a crucial interface between semiconductors and metals is becoming increasingly significant in nano-semiconductor devices.A Schottky barrier,also known as the energy bar-rier,controls the depletion width and carrier transport across the metal-semiconductor interface.Controlling or adjusting Schottky barrier height(SBH)has always been a vital issue in the successful oper-ation of any semiconductor device.This review provides a comprehensive overview of the static and dynamic adjustment methods of SBH,with a particular focus on the recent advancements in nano-semiconductor devices.These methods encompass the work function of the metals,interface gap states,surface modification,image-lowering effect,external electric field,light illumination,and piezotronic effect.We also discuss strategies to overcome the Fermi-level pinning effect caused by interface gap states,including van der Waals contact and 1D edge metal contact.Finally,this review concludes with future perspectives in this field.

Key words

Schottky contact/Schottky barrier height/Adjustment methods/One-and two-dimensional semiconductor

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基金项目

中国科学院青年创新促进会项目(2023175)

国家自然科学基金(T2125003)

中央高校基本科研业务费专项()

出版年

2024
科学通报(英文版)
中国科学院

科学通报(英文版)

CSTPCD
ISSN:1001-6538
参考文献量104
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