首页|Adjustment methods of Schottky barrier height in one-and two-dimensional semiconductor devices

Adjustment methods of Schottky barrier height in one-and two-dimensional semiconductor devices

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The Schottky contact which is a crucial interface between semiconductors and metals is becoming increasingly significant in nano-semiconductor devices.A Schottky barrier,also known as the energy bar-rier,controls the depletion width and carrier transport across the metal-semiconductor interface.Controlling or adjusting Schottky barrier height(SBH)has always been a vital issue in the successful oper-ation of any semiconductor device.This review provides a comprehensive overview of the static and dynamic adjustment methods of SBH,with a particular focus on the recent advancements in nano-semiconductor devices.These methods encompass the work function of the metals,interface gap states,surface modification,image-lowering effect,external electric field,light illumination,and piezotronic effect.We also discuss strategies to overcome the Fermi-level pinning effect caused by interface gap states,including van der Waals contact and 1D edge metal contact.Finally,this review concludes with future perspectives in this field.

Schottky contactSchottky barrier heightAdjustment methodsOne-and two-dimensional semiconductor

Jianping Meng、Chengkuo Lee、Zhou Li

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Beijing Institute of Nanoenergy and Nanosystems,Chinese Academy of Sciences,Beijing 101400,China

School of Nanoscience and Engineering,University of Chinese Academy of Sciences,Beijing 100049,China

Department of Electrical and Computer Engineering,National University of Singapore,Singapore 117583,Singapore

Center for Intelligent Sensors and MEMS,National University of Singapore,Singapore 117608,Singapore

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中国科学院青年创新促进会项目国家自然科学基金中央高校基本科研业务费专项

2023175T2125003

2024

科学通报(英文版)
中国科学院

科学通报(英文版)

CSTPCD
ISSN:1001-6538
年,卷(期):2024.69(9)
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