四氟化锗中痕量气体杂质的气相色谱分析
Analysis of Trace Gas Impurities in Germanium Tetrafluoride by Gas Chromatography
周红艳 1姜雪 1石鹏远 1王珂 1高林华 1李于教1
作者信息
- 1. 核工业理化工程研究院 粒子运输与富集技术全国重点实验室,天津 300180
- 折叠
摘要
建立了气相色谱法测定高纯四氟化锗中痕量气体杂质的方法,设计气路切割过程并研制高密封性吹扫进样系统.采用 GOW MAC 816 气相色谱,载气为氦气,采用脉冲放电氦离子化检测器(PDHID).结果表明:各项杂质分离效果良好,平行实验相对标准偏差均在 5%以下.该方法准确可靠,可用于高纯四氟化锗中痕量气体杂质的测定.
Abstract
A gas chromatography method for the determination of trace gas impurities in high purity germanium tetrafluoride was established.The cutting process of gas path was designed and the high sealing purge injection system was developed.GOW MAC 816 gas chromatography with helium as carrier gas and hydrogen flame ionization detector was adopted.The results showed great separation effect of all impurities,and the relative standard deviation of parallel test was less than 5%.The accuracy and reliability make it suitable for the determination of trace gases in high purity germanium tetrafluoride.
关键词
四氟化锗/气相色谱/痕量气体杂质Key words
Germanium tetrafluoride/Gas chromatography/Trace gas impurities引用本文复制引用
出版年
2024
NETL
NSTL
维普
万方数据