辽宁化工2024,Vol.53Issue(2) :230-233.

改性分子筛对噻吩吸附效果的考察

Investigation on Adsorption Effect of Thiophene Over Modified Molecules Sieve

刘聪 单红飞
辽宁化工2024,Vol.53Issue(2) :230-233.

改性分子筛对噻吩吸附效果的考察

Investigation on Adsorption Effect of Thiophene Over Modified Molecules Sieve

刘聪 1单红飞1
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作者信息

  • 1. 沈阳三聚凯特催化剂有限公司,辽宁 沈阳 110144
  • 折叠

摘要

噻吩在工业中最难除去,除了进行加氢处理转化成硫化氢后对硫化氢脱除以外,通常采用分子筛进行物理吸附脱除.研究分子筛吸附机理,采用分子筛与金属离子液相交换的方式,制造金属与分子筛之间的相互作用关系,以达到高效的噻吩吸附.实验以分子筛为载体,负载其他金属活性组分,采用静态吸附的方式,验证实验结果,考察不同改性金属对噻吩吸附效果的影响.首先考察不同分子筛载体的吸附效果,选择最优分子筛作为载体.筛选不同金属浸渍的吸附效果,考察金属离子交换效果,选出吸附效果最好的金属离子,以 2 种金属离子同时交换,以分子筛与金属离子,金属离子之间的相互作用,达到最好的吸附效果.以NaY为载体,Cu-Ce为活性组分对噻吩具有较好的吸附效果.

Abstract

Thiophene is the most difficult to remove in the industry.In addition to the removal of hydrogen sulfide after converting hydrogen sulfide,thiophene is usually adsorbed by molecular sieves.The molecular sieve adsorption mechanism was studied,and the interaction between metal and molecular sieve was made by liquid phase exchange between molecular sieve and metal ions,so as to achieve efficient thiophene adsorption.In the experiment,molecular sieve was used as the carrier,and other metal active components were loaded.The experimental results were verified by static adsorption,and the effects of different modified metals on thiophene adsorption were investigated.Firstly,the adsorption effects of different molecular sieve carriers were investigated,and the optimal molecular sieve was selected as the carrier.The adsorption effect of different metal impregnation was screened,and the metal ion exchange effect was investigated.The metal ion with the best adsorption effect was selected.Two metal ions were exchanged at the same time,and the best adsorption effect was achieved by the interaction between molecular sieve,metal ions and metal ions.Using NaY as carrier and Cu-Ce as active component had good adsorption effect on thiophene.

关键词

NaY分子筛/有机硫吸附/分子筛改性

Key words

NaY molecular sieve/Organic sulfur adsorption/Molecular sieve modification

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出版年

2024
辽宁化工
辽宁省化工学会

辽宁化工

影响因子:0.234
ISSN:1004-0935
参考文献量2
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