辽宁化工2024,Vol.53Issue(8) :1146-1151.

O含量对(FeCoCrNiAlRe)Ox高熵氧化物扩散障性能的影响

Effect of O Content on Diffusion Barrier Properties of(FeCoCrNiAlRe)Ox High-Entropy Oxides

张力文 张丽 张伟强
辽宁化工2024,Vol.53Issue(8) :1146-1151.

O含量对(FeCoCrNiAlRe)Ox高熵氧化物扩散障性能的影响

Effect of O Content on Diffusion Barrier Properties of(FeCoCrNiAlRe)Ox High-Entropy Oxides

张力文 1张丽 1张伟强1
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作者信息

  • 1. 沈阳理工大学材料科学与工程学院,辽宁 沈阳 110159
  • 折叠

摘要

用磁控溅射在单晶硅基底上沉积了(FeCoCrNiAlRe)Ox高熵氧化物陶瓷类薄膜,并探究不同O含量对在 700℃退火温度下对Cu-Si互扩散的阻挡能力.采用SEM扫描电镜、EDS能谱仪、XRD衍射仪对薄膜进行表征.结果表明:(FeCoCrNiAlRe)Ox高熵氧化物薄膜质地较为致密,元素分布均匀,不同氧含量下制备的高熵氧化物薄膜均为非晶结构,且对Cu-Si的扩散有较好的阻扩散能力.

Abstract

(FeCoCrNiAlRe)Ox high-entropy oxide ceramic thin films were deposited on monocrystalline silicon substrate by magnetron sputtering,and the resistance of different O contents to Cu-Si interdiffusion at 700℃annealing temperature was investigated.The films were characterized by SEM,EDS and XRD.The results showed that the high-entropy oxide thin films of(FeCoCrNiAlRe)Ox were dense in texture and uniform in element distribution.The high-entropy oxide thin films prepared with different oxygen contents were amorphous and had good diffusion resistance to Cu-Si.

关键词

高熵氧化物薄膜/扩散障/磁控溅射/Cu-Si扩散

Key words

High-entropy oxide film/Diffusion barriers/Magnetron sputtering/Cu-Si diffusion

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基金项目

2022年度教育厅基本科研项目面上项目(LJKMZ20220592)

出版年

2024
辽宁化工
辽宁省化工学会

辽宁化工

影响因子:0.234
ISSN:1004-0935
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