利用双靶磁控溅射技术,通过固定铬靶的直流功率,改变钽靶的射频功率,在CrNi3MoVA钢表面制备钽铬合金薄膜,探究溅射功率对钽铬合金薄膜的性能影响.利用扫描电镜/能谱仪和 X 射线衍射仪分析不同功率(80～120 W)条件下钽铬合金薄膜的沉积速率和物相组成,通过纳米压痕仪和电化学工作站测试薄膜的力学性能和耐腐蚀性能.结果表明,随着溅射功率增大,薄膜中钽元素含量增加,薄膜整体衍射峰强度增强.钽靶溅射功率为90 W时,薄膜拥有最高的硬度(16.45 GPa)、模量(238.4 GPa)和较佳的弹塑性.当钽靶功率为120 W时,薄膜的腐蚀电流为0.99 μA·cm-2,耐蚀性最佳.
Influence of Sputtering Power on Magnetron Sputtering of Tantalum-Chromium Alloy Thin Films
Using dual-target magnetron sputtering technology,tantalum-chromium alloy thin films were prepared on the surface of CrNi3MoVA steel by fixing the DC power of the chromium target and varying the RF power of the tantalum target,the effect of sputtering power on the properties of tantalum-chromium alloy thin films was investigated.Scanning electron microscope/energy spectrometer and X ray diffractometer were used to analyze the deposition rate and phase composition of CrNi3MoVA thin films under different power conditions(80～120 W),and the mechanical properties and corrosion resistance of the films were tested by nanoindentation instrument and electrochemical workstation.The results showed that with the increase of sputtering power,the content of tan elements in the films increased,and the overall diffraction peak intensity of the films was enhanced.When the sputtering power of the tantalum target was 90 W,the films possessed the highest hardness(16.45 GPa),modulus(238.4 GPa)and better elasticity and plasticity.When the tantalum target power was 120 W,the films had the best corrosion resistance with a corrosion current of 0.99 μA·cm-2.
Magnetron sputteringTantalum-chromium alloy thin filmsSputtering power
万方数据
维普
