Recent progress of experimental fluid mechanics for EUV sources
The extreme ultraviolet(EUV)source is the enabling component of the EUV lithography.The commercialized EUV source is based on laser produced plasma from tin droplet target.EUV source is essentially a fluid-state light source,which involves rich and complex fundamental fluid mechanics problems with four characteristic time scales ranging from picoseconds to milliseconds.This review surveys the research progress of experimental fluid dynamics for EUV sources.First,the funda-mental and technical aspects of the generation and control of jet,droplet and liquid film targets are in-troduced.Second,the dynamic response of the three types of targets to pulsed lasers were summarized,with an emphasis on droplet targets.Finally,in order to improve the stability,brightness and life the EUV sources,three key research topics in experimental fluid mechanics worthy of attention are pro-posed:(i)the precise generation and manipulation of fine tin droplet targes with long spacing at high frequencies;(ii)the quantitative physical picture of the expansion and radiation of the laser produced plasma,and(iii)the deformation and fragmentation mechanism of droplet targets and suppression,collection and cleaning technologies for debris.
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