首页|掺硅类金刚石薄膜的HiPIMS-MFMS共沉积制备及其高温摩擦学行为研究

掺硅类金刚石薄膜的HiPIMS-MFMS共沉积制备及其高温摩擦学行为研究

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元素掺杂是提高类金刚石(DLC)薄膜高温耐摩擦性能的重要途径.本文中采用高功率脉冲磁控溅射(HiPIMS)和中频磁控溅射(MFMS)复合技术在304不锈钢表面沉积具有不同Si含量的掺硅类金刚石(Si-DLC)薄膜,利用原子力显微镜、扫描电子显微镜(SEM)、X射线衍射(XRD)、拉曼光谱(Raman)、纳米压痕和UMT-TriboLab摩擦试验机等系统分析了 Si含量对Si-DLC薄膜的结构、力学性能及不同温度下的摩擦学性能的影响,重点探讨了 Si-DLC薄膜在高温下摩擦磨损机制.结果表明:Si-DLC薄膜中Si以四面体碳化硅的形式随机分布于无定型DLC基体中,增强薄膜的韧性.同时,Si掺杂使DLC薄膜向金刚石结构发生转变并显著提高了薄膜的硬度.摩擦结果表明,当Si原子分数为15.38%时,Si-DLC薄膜在常温下的摩擦系数和磨损率最低,同时该薄膜在300℃下能维持在较低的摩擦系数(约0.1),主要是由于Si-DLC薄膜中的四面体碳化硅结构能够提升sp3键的稳定性.此外,Si-DLC薄膜中的Si在高温摩擦时会在对偶球表面形成1层SiO2保护层,减缓Si-DLC薄膜和过渡层的氧化,使得薄膜能够在高温下持续润滑.当Si含量进一步增加时,Si-DLC薄膜的力学性能显著提升,然而其摩擦学性能发生明显降低,主要是当DLC薄膜中的硅含量过高时,大气环境下的高温摩擦使得薄膜内的氧化加剧,过量氧化硅的生成破坏了薄膜结构从而导致摩擦性能下降.
High Temperature Tribological Behaviours of Silicon Doped Diamond-Like Films Produced by Hybrid HiPIMS-MFMS Co-Sputtering
Element doping is an important way to improve the thermal stability and tribological properties of diamond like carbon(DLC)films.In this paper,silicon doped hydrogen-free diamond-like carbon(Si-DLC)films with different Si contents were deposited on AISI 304 stainless steel substrate by a hybrid high-power impulse magnetron sputtering and mid-frequency magnetron sputtering(HiPIMS-MFMS)co-sputtering system.The effects of Si contents on the microstructure,mechanical and tribological properties of DLC films were systematically studied by atomic force microscope(AFM),scanning electron microscope(SEM),X-ray diffraction(XRD),Raman spectroscopy,nano-indentation and UMT-TriboLab friction testing machine.The friction and wear mechanism of Si-DLC films at high temperature atmosphere was emphatically discussed.The results showed that Si atoms were randomly distributed in the amorphous DLC matrix in the form of tetrahedral silicon carbide,which effectively enhanced the toughness of the films.At the same time,the study also found that Si doping made the atomic structure of Si-DLC films changed more from graphite to diamond structure,thus improved the hardness of the films to a certain extent.In addition,the atomic clusters formed during doping increased the surface roughness of the films.The room temperature friction and wear results showed that the tribological properties of the films were improved by the appropriate amount of Si doping.When atom fraction of Si was 15.38%,the friction coefficient and wear rate of Si-DLC film at room temperature were the lowest.The high temperature friction results showed that the addition of silicon significantly enhanced the high temperature resistance and tribological properties of the film.The friction coefficient of Si-DLC film could also maintain a low value(about 0.1)at 300℃.It was due to the tetrahedral silicon carbide structure in Si-DLC films could improve the stability of sp3 bond.At the same time,the form of silicon oxide protective layer in Si-DLC film surface during high temperature friction process could slow down the oxidation of Si-DLC films and transition layer,so that the films could maintain a low friction coefficient and wear rate until 300 ℃.In addition,the large number of transfer films observed on the dual sphere was also an important reason for the low friction coefficient of the films.With the further increase of atom fraction of Si to 24.62%,the mechanical properties of Si-DLC films were improved,but the tribological properties of the films were decreased significantly.The main reason was that when Si content in Si-DLC film was too high,the high temperature friction in the air was easy to aggravate the oxidation of the films,thus generating more silicon oxide.The formation of excessive silicon oxide damaged the original structure of Si-DLC film,resulting in a significant degradation in the friction performance the films.

high-power impulse magnetron sputteringdiamond-like carbon filmelement dopinghigh-temperaturefriction and wear

陈彦军、苏峰华、孙建芳、陈泽达、林松盛、李助军

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华南理工大学机械与汽车工程学院,广东广州 510640

广东省科学院新材料研究所现代材料表面工程技术国家工程实验室,广东广州 510650

广东省现代表面工程技术重点实验室,广东广州 510650

广州铁路职业技术学院机电工程学院,广东广州 510430

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高功率脉冲磁控溅射 类金刚石薄膜 元素掺杂 高温 摩擦磨损

国家自然科学基金项目广东省自然科学基金项目广东省特支计划团队项目广东省科学院发展专项资金项目广东省科学院发展专项资金项目

521751682021A15150122662019BT02C6292020GDASYL-202001031072022GDASZH-2022010103

2024

摩擦学学报
中国科学院兰州化学物理研究所

摩擦学学报

CSTPCD北大核心
影响因子:0.815
ISSN:1004-0595
年,卷(期):2024.44(1)
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