Advances in photocatalytic removal of NOx and VOCs from flue gas
Nitrogen oxides(NOx)and volatile organic compounds(VOCs)are significant precursors to particulate matter(PM2.5)and ozone(O3),posing serious health hazards.Photocatalytic oxidation technology is gaining increasing attention due to its mild conditions,energy efficiency,safety,and non-toxic nature.Currently,semiconductor photocatalysts,primarily based on TiO2,exhibit unique physi-cochemical properties and excellent performance,becoming a focal point in current research on atmos-pheric pollution control.This review summarizes the latest research progress in the photocatalytic oxida-tion technology for the individual and simultaneous removal of NOx and VOCs,with a focus on the po-tential roles of TiO2 photocatalysts and other photocatalysts.It also explains strategies for enhancing photocatalytic activity,such as noble metal doping,non-metal doping,and semiconductor coupling.Additionally,it reviews experimental parameters,removal efficiency,and degradation mechanisms for photocatalytic degradation of flue gas NOx and VOCs.This review aims to summarize the structure-per-formance-application relationship in the development of semiconductor photocatalytic materials,provide parameter support and optimization suggestions for research on the simultaneous removal of flue gas NOx and VOCs,discuss new catalyst preparation and modification approaches,and promote future research on the co-removal of NOx and VOCs by photocatalytic oxidation.
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