纳米科技2009,Vol.6Issue(5) :3-10.

纳米蚀刻技术、性能及应用

Advance of Nanolithography,its Applications and Prospects

陈宜方
纳米科技2009,Vol.6Issue(5) :3-10.

纳米蚀刻技术、性能及应用

Advance of Nanolithography,its Applications and Prospects

陈宜方1
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作者信息

  • 1. 英国卢瑟福Appleton国家实验室微纳技术中心
  • 折叠

Abstract

This paper will review the development of nanolithography,nanofabrication technology and their applications in nanoelectronics,nano-bioscience,nanophotonics and photonic metamaterials.The scope of the techniques in this review is within top-down regime covering a large area (EBL,NIL,hot embossing,RIE,novel lift-off process and nanofabrications).Then,the latest development in nanolithography such as near field lithography and combined nanoimprint and photolithography (CNP) will be presented.The prospective extension of nanolithography developed at laboratory level to industrial application will be discussed.The final conclusion of this paper is to convince people that the socalled nanotechnology is to make things smaller for larger functionality.

关键词

nanolithography/near field lithography/combined nanoimprint/photolithography

Key words

nanolithography/near field lithography/combined nanoimprint/photolithography

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出版年

2009
纳米科技
西安纳米科技学会 陕西省电子学会纳米技术专业委员会

纳米科技

ISSN:1812-1918
参考文献量81
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