In order to reduce silicon wafer cleaning quality problems caused by silicon wafer box cleanliness in the semiconductor industry,improve the cleaning efficiency of silicon wafer boxes,and minimize the use of chemical liquid,a silicon wafer box spray cleaning device was designed.The device structure was designed by wet cleaning with upper spray and lower immersion chemical liquid.The design parameters of the spray nozzle structure were calculated based on atomization theory;The skeleton,tank and spray device of chemical liquid silicon wafer box spray cleaning device were modeled and simulated.The research results show that the device can minimize the quantity of chemical liquid and exhaust gas emissions while maintaining the cleaning effect,and prevent wafer surface quality from being impacted by inadequate silicon wafer box cleanliness.This design provides a more efficient and economical reference solution for cleaning silicon wafer boxes.
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