首页|N和As掺杂二维GeC光电性质的第一性原理研究

N和As掺杂二维GeC光电性质的第一性原理研究

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本文基于密度泛函理论第一性原理,系统研究了单层GeC,N掺杂、As掺杂及N-As共掺杂GeC体系的稳定性、电子结构及光学性质等.结果表明,单层GeC是一种禁带宽度为2.10 eV的直接带隙半导体.与单层GeC相比,掺杂后体系的禁带宽度和功函数均减小,表明体系的电子跃迁所需的能量相对较少.并且,掺杂后体系的光吸收系数均有所提高,同时吸收带边也发生了红移,有效拓宽了体系对光的响应范围,提高了体系对光子的吸收能力.此外,As掺杂GeC体系不仅在费米能级附近出现了杂质能级,而且在低能区的吸收系数、静介电函数及消光系数等光学性质最优.本研究可为GeC光电相关实验制备提供理论基础.
First-Principles Study on the Photoelectric Properties of N and As Doped Two-Dimensional GeC
Based on the first-principles calculations of density functional theory,the stability,electronic structure,and optical properties of single layer GeC,N-doped,As doped,and N-As doped GeC systems were systematically studied.The results show that the single layer GeC is a direct bandgap semiconductor with the bandgap of 2.10 eV.Compared with the single layer GeC,the bandgap and work function of the doped system decrease,indicating that the required energy for electronic transition is relatively small in our doped system.Moreover,the light absorption coefficient of the doped system improves,and the absorption band edge has also undergone a red shift,effectively expanding the response range of the system to light and improving the absorption ability of the system to photons.In addition,the As doped GeC system not only exhibits impurity levels near the Fermi level,but also shows the optimal optical properties such as absorption coefficient,static dielectric function,and extinction coefficient in the low energy region.The above research can provide a theoretical basis for the preparation of relevant GeC photoelectric experiments.

GeCdopingfirst-principleelectronic structureoptical property

李萍、秦彦军、庞国旺、唐玉柱、张遥、王鹏、刘晨曦

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新疆理工学院理学院,阿克苏 843100

新疆理工学院机电工程学院,阿克苏 843100

西安工业大学光电工程学院,陕西省薄膜技术与光学检测重点实验室,西安 710021

GeC 掺杂 第一性原理 电子结构 光学性质

新疆维吾尔自治区自然科学基金新疆维吾尔自治区自然科学基金新疆维吾尔自治区重点研发计划

2021D01B462021D01B472020B02011

2024

人工晶体学报
中材人工晶体研究院

人工晶体学报

CSTPCD北大核心
影响因子:0.554
ISSN:1000-985X
年,卷(期):2024.53(3)
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