人工晶体学报2024,Vol.53Issue(8) :1453-1463.

基底温度对磁控溅射制备NiOx薄膜综合电致变色性能的影响

Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiOx Films

蔡晓佳 黄家健 孙丹丹 梁嘉盈 唐秀凤 张炯
人工晶体学报2024,Vol.53Issue(8) :1453-1463.

基底温度对磁控溅射制备NiOx薄膜综合电致变色性能的影响

Effect of Substrate Temperature on Comprehensive Electrochromic Properties of Magnetron Sputtered NiOx Films

蔡晓佳 1黄家健 1孙丹丹 2梁嘉盈 3唐秀凤 1张炯3
扫码查看

作者信息

  • 1. 五邑大学应用物理与材料学院,江门 529020
  • 2. 东莞理工学院化学工程与能源技术学院,东莞 523808
  • 3. 五邑大学土木建筑学院,江门 529020
  • 折叠

摘要

为研究基底温度对NiO,薄膜综合电致变色性能的影响,在基底温度分别为室温、50、100、200和300℃下,采用直流反应磁控溅射法制备了 NiOx薄膜,并对薄膜的形貌、循环稳定性、光学调制率、记忆效应、响应时间和附着力等性能进行测试表征和对比分析.研究结果表明,基底温度对NiOx薄膜的电致变色性能影响较为复杂,基底温度为100 ℃时制备的薄膜综合性能最优,具有电荷容量密度衰减率低、记忆效应好、响应速度快、调制率高和与基底附着力较好等特点.本研究对NiOx基电致变色器件的设计和制备具有一定的参考意义.

Abstract

In order to study the effect of the substrate temperature on the electrochromic properties of NiOx film,DC reaction magnetron sputtering method was used to prepare NiOx film at different substrate temperatures,i.e,room temperature,50,100,200 and 300 ℃.The properties of the films including structure and morphology,cyclic stability,optical modulation rate,memory effect,response time,and adhesion to the substrate were explored and compared.The results show that the effect of the substrate temperature on the electrochromic properties of NiOx film is complicated.NiOx film prepared at 100 ℃shows low charge capacity density decay rate,good memory effect,fast response speed,high modulation rate and good adhesion to the substrate.This study may have certain reference significance for the design and fabrication of NiOx-based electrochromic devices.

关键词

电致变色/NiOx/响应时间/记忆效应/循环稳定性/附着力

Key words

electrochromic/NiOx/response time/memory effect/cyclic stability/adhesion

引用本文复制引用

基金项目

国家自然科学基金(12004285)

五邑大学创新创业基金(2022CX47)

出版年

2024
人工晶体学报
中材人工晶体研究院

人工晶体学报

CSTPCD北大核心
影响因子:0.554
ISSN:1000-985X
参考文献量2
段落导航相关论文