人工晶体学报2024,Vol.53Issue(12) :2167-2172,2180.

基于混合配体的镍(Ⅱ)MOF基电催化剂的合成、结构表征及性能研究

Synthesis,Structure Characterization and Properties of Nickel(Ⅱ)MOF-Based Electrocatalyst Based on Mixed Ligands

潘会宾 乔得聪 王嘉欣 高霞 卢久富
人工晶体学报2024,Vol.53Issue(12) :2167-2172,2180.

基于混合配体的镍(Ⅱ)MOF基电催化剂的合成、结构表征及性能研究

Synthesis,Structure Characterization and Properties of Nickel(Ⅱ)MOF-Based Electrocatalyst Based on Mixed Ligands

潘会宾 1乔得聪 2王嘉欣 2高霞 3卢久富2
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作者信息

  • 1. 商洛职业技术学院公共课教学部,商洛 726000;陕西理工大学催化基础与应用重点实验室,化学与环境科学学院,汉中 723001
  • 2. 陕西理工大学催化基础与应用重点实验室,化学与环境科学学院,汉中 723001
  • 3. 商洛学院化学工程与现代材料学院,商洛 726000
  • 折叠

摘要

在溶剂热条件下,以Ni(N03)2·6H20为金属源、五甲基间苯二甲酸(H2MIP)配体和1,3-双(2-甲基-1H-咪唑-1-基)丙烷(BMIP)为混合配体,构筑了一例新型Ni(Ⅱ)有机骨架材料{[Ni4(MIP)4(BMIP)3]·DMF}n(SNUT-36).X射线单晶衍射结果表明:SNUT-36呈现一个4,6链接双节点的二重穿插的三维骨架结构,拓扑分析数据为(32·45·5·67)(34·47·5·63).进一步通过粉末X射线衍射、红外光谱、热重分析等手段对得到的配合物进行表征.此外,化学测试结果显示,SNUT-36达到20 mA·cm-2时的过电位为430 mV,表明其具有良好的电催化性能,Tafel斜率为89 mV·dec-1,也证实了其对提高析氧反应速率具有良好的效果.

Abstract

Under solvothermal conditions,using Ni(NO3)2·6H2O as the metal source,pentamethy lisophthalic acid(H2MIP)ligand and 1,3-bis(2-methyl-lH-imidazol-l-yl)propane(BMIP)as mixed ligands,a new Ni(Ⅱ)organic framework material,)[Ni4(MIP)4(BMIP)3]·DMF}n(SNUT-36),was constructed.X-ray single crystal diffraction analysis shows that SNUT-36 presents a binodal(4,6)connected double-interpenetrated three-dimensional skeleton structure with topological analysis data of(32·45·5·67)(34·47·5·63).The obtained complex was further characterized by powder X-ray diffraction,infrared spectroscopy,thermogravimetric analysis and other means.In addition,the electrochemical test results show that SNUT-36 achieve an overpotential of 430 mV at 20 mA·cm-2,indicating its good electrocatalytic performance.The Tafel slope of 89 mV·dec-1 also confirmed its good effect on improving the oxygen evolution reaction rate.

关键词

Ni(Ⅱ)有机骨架材料/溶剂热/电催化/混合配体/析氧反应

Key words

Ni(Ⅱ)organic framework/solvothermal/electro-catalysis/mixed ligand/oxygen evolution reaction

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出版年

2024
人工晶体学报
中材人工晶体研究院

人工晶体学报

CSTPCD北大核心
影响因子:0.554
ISSN:1000-985X
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