X荧光玻璃熔片法分析锰硅合金的应用
Application of X-ray Fluorescence Glass Melting Plate Method for Analyzing Manganese Silicon Alloy
杨鹏 1高小龙 1刘小明 1王江华1
作者信息
- 1. 山西中阳钢铁有限公司质检中心,山西 吕梁 033400
- 折叠
摘要
化学分析方法分析锰硅合金中硅、锰、磷等成分时步骤繁琐,分析速度慢,人为误差多,无法满足生产的需要;采用X荧光玻璃熔片法更加便捷,通常采用直接熔融法分析锰硅合金时能够对铂金坩埚形成腐蚀,同行业中采用无水四硼酸锂挂壁后氧化方式进行分析,对人员操作要求较高.本方法通过无水四硼酸锂衬底,硼酸及碳酸锂作氧化剂,在 700～900℃范围内进行氧化处理,将其中的硅、锰、磷单质进行氧化变为氧化态,进而避免坩埚的腐蚀,实现熔片快速分析.通过本方法的应用,能够大幅提高分析效率,且过程简单,准确度高,便于推广,同时可减少各类腐蚀性危险化学药品的使用,适应企业快节奏的生产需求.
Abstract
The chemical analysis method is cumbersome for examining of silicon,manganese,phosphorus and other components in manganese-silicon alloy,however,the analysis speed is slow,and the human error is relatively large,which can't meet the needs of production.The use of X-ray fluorescence glass melting method is more convenient.When using direct melting method to analyze manganese silicon alloy,it can cause corrosion to platinum crucibles.Anhydrous lithium tetraborate wall hanging and oxidation method is used for analysis,which requires high personnel operation requirements within the same field.In this research,anhydrous lithium tetraborate are used as substrate,boric acid and lithium carbonate as oxidants,and oxidation treatment is carried out in the range of 700～900℃,meanwhile the silicon,manganese and phosphorus elements are oxidized into oxidized state for avoiding the corrosion of the crucible and realize the rapid analysis of the fused piece.This method can greatly improve the analysis efficiency with simple process and high accuracy,it is easy to promote,meanwhile it can reduce the various corrosive and dangerous chemicals,furthermore the fast-paced production needs of enterprises can be adapted.
关键词
X射线荧光/无水四硼酸锂/玻璃熔片/锰硅合金Key words
X-ray fluorescence/anhydrous lithium tetraborate/glass fused sheet/manganese-ailicon alloy引用本文复制引用
出版年
2024
NETL
NSTL
万方数据