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高纯钨粉制备工艺研究

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以高纯APT为主要对象进行了研究,针对适合于高纯钨溅射靶的高纯钨粉,通过酸沉淀法和两段式氢还原法工艺,获得高纯度的高纯钨粉.通过酸沉淀法将高纯APT制成WO3粉末.再以WO3为原料,采用两段式氢还原法制备高纯钨粉.将制得的高纯钨粉进行GDMS纯度分析,并与5N标准进行对比,得出大部分杂质元素成分小于5N标准,整体杂质质量分数小于0.000 2%,说明所制备钨粉达到5N级高纯钨粉的纯度要求.
Research on the Preparation Process of High Purity Tungsten Powder
High purity APT was studied as the main object,and high-purity tungsten powder suitable for high-purity tungsten sputtering targets was obtained through acid precipitation and two-stage hydrogen reduction processes.Produce high-purity APT into WO3 powder through acid precipitation method.Using WO3 as raw material,high-purity tungsten powder was prepared by two-stage hydrogen reduction method.Perform GDMS purity analysis on the prepared high-purity tungsten powder and compare it with the 5N element standard.It is found that most of the impurity elements are less than the 5N standard,and the overall impurity is less than 0.000 2%,indicating that the prepared tungsten powder meets the purity requirements of 5N grade high-purity tungsten powder.

high-purity tungsten powderacid precipitation methodtwo-stage hydrogen reduction

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赣州江钨钨钼新材料有限公司,江西 赣州 341000

高纯钨粉 酸沉淀法 两段式氢还原

2024

山西冶金
山西省金属学会 山西省有色金属学会

山西冶金

影响因子:0.139
ISSN:1672-1152
年,卷(期):2024.47(10)